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281 results about "Nanohole array" patented technology

Preparation method of panchromatic structural color or color variation pattern array

InactiveCN103145095AThe method involved is simpleControllable methods involvedDecorative surface effectsChemical vapor deposition coatingDielectricPolystyrene
The invention discloses a preparation method of a panchromatic structural color or color variation pattern array, belongs to the technical field of materials, and in particular relates to a method for preparing a panchromatic structural color or color variation pattern array by regulating the environment dielectric constants of an upper interface and a lower interface of a noble metal nanopore array. The preparation method comprises the following steps of: cleaning and surface hydrophilization treatment, the preparation of polystyrene single layer colloidal crystals, the construction for covering the noble metal nanopore array by a silicon oxide layer, the construction of a suspension noble metal nanopore array, selective regulation and control of the environment dielectric constant around the noble metal nanopore array and the like. The obtained noble metal nanopore array has a transmission peak adjustable within a visible light wave band (350nm-800nm), so that different single-color patterns or color patterns are shown, the apparent color of a single color sample can be changed along with the change of the external environment dielectric constant; and color change, disappear and reproduction of the array patterns can be realized for the color pattern sample along with the change of the external environment dielectric constant.
Owner:JILIN UNIV

Manufacturing method of surface-plasmon-enhanced GaN-based nanopore LED

A manufacturing method of a surface-plasmon-enhanced GaN-based nanopore LED includes the following steps of firstly, sequentially growing an n-type InAlGaN layer, a non-doped or doped multi-quantum-well layer, a p-type InAlGaN layer and a current expansion layer on a substrate; secondly, conducting downward etching on the current expansion layer into the n-type InAlGaN layer through a photo-etching and dry-etching process so that a GaN-based LED structure nanopore array can be formed; thirdly, conducting downward etching on the portion, located on one side of the GaN-based LED structure nanopore array, of the upper surface of the current expansion layer to form a tabletop, wherein the etching depth is larger than the depth of nanopores of the GaN-based LED structure nanopore array; fourthly, manufacturing a p electrode on part of the upper surface of the current expansion layer through a photo-etching, evaporating and adhesive tape stripping process; fifthly, manufacturing an n electrode on the tabletop; sixthly, filling the nanopores of the GaN-based LED structure nanopore array with multiple spherical metal nanometer particles with non-conductive film wrapping on the outer surfaces to form a nuclear shell metal nanometer spherical layer, and completing manufacturing.
Owner:INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI

Preparation method for metal Nano structure array

The invention discloses a preparation method for a metal Nano structure array. The preparation method adopts a silicon slice as a substrate, and silica Nano spheres are coated on the surface of the substrate of the silicon slice in a rotary manner after being uniformly dispersed so as to form a single-layer sequential silica Nano sphere compact array; a single-layer sequential silica Nano sphere non-compact array is formed by adopting an induction coupling plasma etching method; a metal layer is deposited on the non-compact array and the silica Nana spheres are removed, so as to obtain a metal Nano hole array reticle mask; corrosion is carried out on the silicon slice by combining different corroding properties of different silicon slices, so as to obtain Nano structure array templates with different characteristics in shape and appearance after the reticle mask is removed; finally, different metal materials are deposited on the templates, and the multi-material metal Nano structure array with diversified characteristics in shape and appearance can be obtained after the templates are separated. With the advantages of low cost, high efficiency, good compatibility and the like, the preparation method provides convenience for studying the optical nature, magnetic performance, catalytic property and the like of the metal Nano structure array.
Owner:NAT UNIV OF DEFENSE TECH

Preparation method and application of metal surface-etched nanoporous array

The invention relates to application of pure titanium and titanium alloy (hereinafter called titanium) surface-etched TiO2 nano-porous array appearance in preparing human metal implant which can be a dental implant, a bone implant, a fixing plate and a fixing nail, wherein the appearance is to prepare a TiO2 nano-porous array structure on the titanium surface. The invention also provides an optimal preparation method of the appearance. The preparation method has the advantages that: the preparation can be performed at normal temperature and normal pressure; the prepared TiO2 nano-porous array is regular; and the method is relatively simple in process, convenient for operation, low in cost and short in process flow. The prepared titanium surface nano-porous array structure has selective effect to different types of cells, so that the success rate of implant can be greatly increased; the nano-porous array structure can inhibit fibroblast from adhering or multiplying on the surface of the structure, so that the success rate of bone and dental implant operation and bone internal fixation can be greatly improved; and therefore, the preparation method is a bone implant material and bone fixation material surface appearance modification method with clinical application prospect.
Owner:SHANGHAI NINTH PEOPLES HOSPITAL AFFILIATED TO SHANGHAI JIAO TONG UNIV SCHOOL OF MEDICINE

Preparation methods of nanopore-arrayed anodic alumina membrane and nanopore-arrayed anodic alumina microchannel plate

InactiveCN104233430AOvercoming noiseOvercoming temporal resolutionSurface reaction electrolytic coatingCold cathode manufactureDark count rateSilicate glass
The invention relates to preparation methods of a nanopore-arrayed anodic alumina membrane and a nanopore-arrayed anodic alumina microchannel plate. The preparation method of the nanopore-arrayed anodic alumina membrane comprises the following steps of preparation of an alumina membrane and directional pore broadening. The preparation method of the nanopore-arrayed anodic alumina microchannel plate comprises the following steps of preparation of an alumina membrane, directional pore broadening and preparation of a microchannel plate. According to the preparation methods of the nanopore-arrayed anodic alumina membrane and the nanopore-arrayed anodic alumina microchannel plate, the technical bottleneck that the channel aperture of the traditional lead-containing silicate glass microchannel plate cannot be easily reduced is overcome; the difficult problems that the area of the microchannel plate is increased if the ultra-small aperture of the microchannel plate is realized and the like are solved; and the excellent properties of the microchannel plate are achieved, i.e., the space resolution and time resolution of the microchannel plate are improved, the gain is increased, the dark count rate is decreased, the area array is enlarged, a higher temperature can be borne and the like.
Owner:XI'AN INST OF OPTICS & FINE MECHANICS - CHINESE ACAD OF SCI
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