Method for preparing nanometer patterning bipolymer brush

A polymer brush and patterning technology, which is applied in the field of preparation of binary polymer brushes, can solve problems such as lack of universality, and achieve the effects of eliminating processing steps, easy operation of the process, and simple and easy method.

Active Publication Date: 2011-04-27
INST OF CHEM CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The above-mentioned method for preparing patterned binary polymer brushes is limited to some specif

Method used

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  • Method for preparing nanometer patterning bipolymer brush
  • Method for preparing nanometer patterning bipolymer brush
  • Method for preparing nanometer patterning bipolymer brush

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] Embodiment 1, prepare patterned PAM / PNIPAM binary polymer brush

[0032] according to figure 1 The process flow shown was carried out.

[0033] (1) After cleaning the silicon wafer, treat it with a mixture of concentrated sulfuric acid (mass concentration: 98%) and hydrogen peroxide (mass concentration: 30%) (mixing ratio: 7:3, v / v) at 120°C for 2 hours, A silicon substrate with a hydrophilic surface is obtained.

[0034] (2) Disperse polystyrene (PS) microspheres with a particle diameter of 500 nm in a water / ethanol mixture (mixing ratio 1:1, v / v) to obtain a suspension of PS microspheres with a mass concentration of 5%. liquid. Take about 2 μL of the above-mentioned PS microsphere suspension and drop it on the above-mentioned silicon substrate, and let the PS microspheres be assembled by spin coating at a speed of 1000 rpm on a desktop homogenizer to obtain a hexagonal stacked nanosphere array pattern (see figure 2 ).

[0035] (3) A 5nm Cr coating and a 10nm Au ...

Embodiment 2

[0041] Embodiment 2, preparation patterned PDMAEMA / PNIPAM binary polymer brush

[0042] (1) According to the steps (1)-(3) of Example 1, a silicon substrate with a hole array pattern was prepared.

[0043] (2) Put the above sample into a methanol solution (10 mM) containing 11-mercaptoundecanol to react for 24 hours, then take it out, rinse and dry it. Weigh 20ml of cyclohexane in a glass reaction bottle, add 100μL of triethylamine and 200μL of 2-BiB, and stir well. Add a silicon substrate and seal the bottle mouth, react at 10°C for 30min. After the sample was reacted, it was washed and dried, and then the surface polymerization was carried out.

[0044] (3) Dissolve 1g of DMAEMA monomer, 20mg of CuCl, and 200μl of PMDETA (pentamethyldiethylenetriamine) in a mixed solvent of 10ml of methanol and water (1:1v / v), and sonicate in the absence of oxygen Mix well, and transfer the solution to another glass reactor containing the substrate for polymerization to obtain a patterned...

Embodiment 3

[0048] Embodiment 3, preparation patterned PAM / PDMAEMA binary polymer brush

[0049] (1) According to the steps (1)-(3) of Example 1, a substrate with a hole array pattern was prepared.

[0050] (2) Put the above sample into an ethanol solution (1 mM) containing 11-mercaptoundecanol to react for 24 hours, then take it out for rinsing and blow dry. Weigh 20 g of dichloromethane into a glass reaction vial, add 60 μL of triethylamine and 120 μL of 2-BiB, and stir well. Add the substrate and seal the bottle mouth, react at 0°C for 20min. After the sample was reacted, it was washed and dried, and then the surface polymerization was carried out.

[0051] (3) Dissolve 0.5g of AM monomer, 10mg of CuCl, and 100μl of PMDETA in a mixed solvent of 5ml of methanol and water (1:1v / v). Polymerization was carried out in another glass reactor of the sheet to obtain a patterned PAM monopolymer brush.

[0052] (4) Put the above sample into NaN 3 DMF solution (0.01M), react at room temperatu...

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Abstract

The invention discloses a method for preparing a nanometer patterning bipolymer brush. The method for preparing a nanometer patterning bipolymer brush combines a nanosphere etching print method and a surface controlled polymerization method together. Polystyrene nanospheres are assembled on a substrate to obtain a hexagonal heaped sphere array pattern which is used as a mask for carrying out surface gold spraying, after small spheres are removed, a regular nanopore array pattern of which the surface component consists of gold and silicon, and surface polymerization is respectively initiated on the gold and the silicon twice to obtain the nano-scale bipolymer brush. The method is simple and efficient, the size of the pattern can be conveniently regulated by using the small spheres with different diameters, and a functional patterning polymer brush can be prepared with the method.

Description

technical field [0001] The invention relates to a preparation method of a nanoscale patterned binary polymer brush. Background technique [0002] In specific studies, in order to achieve multifunctional surfaces, it is often necessary to make polymer brushes into various patterns. Patterned polymer brushes can contain one, two, or even multiple components. Designed, spatially finely structured substrates can provide excellent templates for tissue engineering and biosensors. [0003] At present, the patterning of polymer brushes is mainly realized by various etching methods, mainly including photoetching, electron beam etching, mechanochemical etching (such as dipping pen printing method and electron beam chemical etching) and other methods. The engraving is limited by the wavelength of light, and its spatial resolution is not high. However, electron beam etching and mechanochemical etching have high requirements on processing equipment, high production cost and low product...

Claims

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Application Information

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IPC IPC(8): C03C17/32C04B41/48
Inventor 赵江张存富汪威
Owner INST OF CHEM CHINESE ACAD OF SCI
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