Unlock instant, AI-driven research and patent intelligence for your innovation.

Deep cleansing mint mask

A clean surface and deep layer technology, applied in the field of agricultural development, can solve problems such as burning seedlings, excessive fertility volatilization, and watermelons not growing healthily

Inactive Publication Date: 2018-04-13
邵环宇
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] During the growth process of watermelon, because it is relatively fragile at the seedling stage, the use of traditional fertilization methods can easily cause seedling burn, making the watermelon unable to grow healthily. Too fast, it is difficult to achieve the effect of promoting the growth of watermelon

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0009] A mint deep cleansing mask, comprising the following raw materials in parts by weight: 10 parts of urea, 15 parts of monoammonium phosphate, 12 parts of potassium sulfate, 12 parts of potassium chloride, 5 parts of zinc sulfate, 5 parts of potassium sulfate, 10 parts of cake fertilizer, 2 parts of borax, 2 parts of peat, 2 parts of enzyme bacteria, 5 parts of potassium dihydrogen phosphate, and 5 parts of ammonium phosphate.

Embodiment 2

[0011] A mint deep cleansing mask, comprising the following raw materials in parts by weight: 12 parts of urea, 20 parts of monoammonium phosphate, 15 parts of potassium sulfate, 15 parts of potassium chloride, 6 parts of zinc sulfate, 6 parts of potassium sulfate, 12 parts of cake fertilizer, 3 parts of borax, 3 parts of peat, 3 parts of enzyme bacteria, 8 parts of potassium dihydrogen phosphate, and 8 parts of ammonium phosphate.

Embodiment 3

[0013] A mint deep cleansing mask, comprising the following raw materials in parts by weight: 15 parts of urea, 25 parts of monoammonium phosphate, 20 parts of potassium sulfate, 20 parts of potassium chloride, 8 parts of zinc sulfate, 8 parts of potassium sulfate, 15 parts of cake fertilizer, 4 parts of borax, 4 parts of peat, 4 parts of enzyme bacteria, 10 parts of potassium dihydrogen phosphate, and 10 parts of ammonium phosphate.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a deep cleansing mint mask. The mask comprises, by weight, 10-15 parts of urea, 15-25 parts of monoammonium phosphate, 12-20 parts of potassium sulfate, 12-20 parts of potassium chloride, 5-8 parts of zinc sulfate, 5-8 parts of potassium sulfate, 10-15 parts of a cake fertilizer, 2-4 parts of borax, 2-4 parts of peat, 2-4 parts of enzyme bacteria, 5-10 parts of potassium dihydrogen phosphate and 5-10 parts of ammonium phosphate. A special fertilizer for watermelon, adopting the cake fertilizer, peat and other natural organic substances, can promote the growth of watermelons and reduce the burden of land.

Description

technical field [0001] The invention belongs to the field of agricultural development, and in particular relates to a mint deep cleansing mask. Background technique [0002] During the growth process of watermelon, because it is relatively fragile at the seedling stage, the use of traditional fertilization methods can easily cause seedling burn, making the watermelon unable to grow healthily. Too fast, it is difficult to achieve the effect of promoting the growth of watermelon. Contents of the invention [0003] Purpose of the invention: the purpose of the invention is to provide a mint deep cleansing mask in order to solve the deficiencies in the prior art. [0004] A mint deep cleansing mask, comprising the following raw materials in parts by weight: 10-15 parts of urea, 15-25 parts of monoammonium phosphate, 12-20 parts of potassium sulfate, 12-20 parts of potassium chloride, and 5-8 parts of zinc sulfate , 5-8 parts of potassium sulfate, 10-15 parts of cake fertilize...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C05G3/04C05G3/80
CPCC05B7/00C05G3/80C05C9/00C05D1/02C05D9/02C05F5/002C05F11/02C05F11/08
Inventor 邵环宇
Owner 邵环宇