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A detection device and working method for chemical mechanical polishing pad wear

A detection device and chemical mechanical technology, which is applied to the parts of grinding machine tools, manufacturing tools, metal processing equipment, etc., to achieve the effects of improving detection efficiency and machine utilization, fully using it, and reducing the rate of defective products

Active Publication Date: 2019-12-03
SHANGHAI HUALI MICROELECTRONICS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, there is no automatic detection device, mainly relying on controlling the service life of the grinding pad and manual detection to prevent the grinding pad from grinding

Method used

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  • A detection device and working method for chemical mechanical polishing pad wear
  • A detection device and working method for chemical mechanical polishing pad wear

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Experimental program
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Embodiment Construction

[0027] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments, but not as a limitation of the present invention.

[0028] figure 1 It is a schematic diagram of a detection device for chemical mechanical polishing pad wear of the present invention. figure 2 It is a schematic diagram of a polishing pad worn by a chemical mechanical polishing pad of the present invention.

[0029] See Figure 1 to Figure 2 Shown, in a kind of preferred embodiment, a kind of detection device of chemical mechanical polishing pad wearing and tearing, wherein, comprise:

[0030] The laser light source 1 is arranged in the grinding disc 2 , and the laser light source 1 is covered with a transparent glass window 11 .

[0031] Detection device 4, detection device 4 is installed on trimmer 5, and grinding pad 3 is positioned at the below of detection device 4; Detection device 4 comprises light receiver 41, grinding pad monitor 42 ...

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PUM

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Abstract

The invention discloses a detecting device and a working method for wear of a chemical mechanical grinding pad. The detecting device comprises a laser light source, wherein the laser light source is arranged in a grinding disc, and the laser light source is covered with a transparent glass window; a detection device is further arranged, the detection device is installed on a connecting rod of a trimmer; the detection device comprises a light receiver, a grinding pad monitor and a monitor shell; and the monitor shell is a cover body with an upward opening, the light receiver is arranged on theupper end surface of the inner wall of the cover body, and the light receiver is connected with the grinding pad monitor. According to the detecting device and the working method, the wear condition of the grinding pad can be automatically detected in real time by using an optical method, and the defective product rate caused by the wear condition is greatly reduced.

Description

technical field [0001] The invention relates to the technical field of chemical mechanical polishing pad wear, in particular to the technical field of a chemical mechanical polishing pad wearing detection device and working method. Background technique [0002] In the current wafer chemical mechanical polishing machine, there is no device for monitoring the wear of the polishing pad. It mainly relies on manual visual inspection to find the wear, and reminds the replacement of the polishing pad through the uniform service life. Manual visual inspection is highly subjective, not accurate enough and not easy to standardize. Unified life control often results in severe wear of individual machine grinding pads and is still in use. Severe wear of the polishing pad will cause the grooves in some areas on the polishing pad to become shallower, weaken the ability to transport the polishing liquid, and make the distribution of the polishing liquid uneven, resulting in a decrease in t...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B24B49/00
CPCB24B49/00
Inventor 陈智
Owner SHANGHAI HUALI MICROELECTRONICS CORP
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