Dual-lens and direct-writing exposure machine system

Abstract

The invention relates to a laser exposure technology, in particular to a dual-lens and laser direct-writ exposure machine system. A digital micromirror device (DMD) in a scanning type laser direct-writing exposure device in the current market only can output a strip, the intensity of exposure energy can be sacrificed by employing a mode of changing rate of a lens to expand exposure coverage surface, the system complexity and system cost can be improved by multiple by employing a mode of combining a plurality of DMDs, and the system stability can be reduced. A beam split system is arranged under the DMD, reflective light on the DMD is divided to two edges, and the area covered by a single DMD is expanded by multiple; under the same condition, the required quantity of the DMD is only half ofthat of the prior art; and since the usage quantity of the DMD is substantially reduced, the system complexity can be reduced, and the running stability of the system is also improved, meanwhile, theinput quantity of the DMD is reduced by half, and the equipment cost is also substantially reduced.

Description

technical field [0001] The invention relates to laser exposure technology, in particular to a dual-lens direct-write exposure machine system. Background technique [0002] In the field of laser direct writing lithography for semiconductor and PCB manufacturing, the principle of scanning exposure using laser direct imaging technology is as follows: the use of digital micromirror device (Digital Micromirror Device, referred to as (DMD) micro-lens high-speed flip capability, combined with appropriate light source and Projection optical system, when the microlens is ON, the outgoing light will be projected to the substrate, when the microlens is OFF, the outgoing light will exit the optical path, and there is no outgoing light at the substrate. By continuously projecting uniform light to the DMD, real-time and collective changes The switching state of the microlens array achieves the purpose of exposing different patterns on the substrate. [0003] At present, the scanning expo...

AI Technical Summary

Problems solved by technology

[0005] 1) Change the magnification of the lens to make the DMD spot larger. Although this method will increase the width of the strip scanning belt, it will sacrifice the energy intensity of the exposure light source and the minimum processing accuracy of the machine;

[0006] 2) Using multiple DMD lens groups: Using a single DMD exposure requires multiple scans, which will lead to low production capacity in large-area processing; multiple DMD combinations can greatly increase production capacity. The amount of DMD used will be more

If you want to achieve the ability to cover a full-page with a line width of 50um and a board width of 600mm, the number of DMDs required is currently more than 12. If the data processing method is not appropriate, the amount of data processing will be huge, which will lead to the failure of the system solution. Situation; In addition, the equipment uses multiple DMDs, and the equipment investment cost is high

Images