COA-type array substrate

Abstract

The invention provides a COA type array substrate, which can be used to make use of the first metal layer and / or the second metal layer by setting all or part of the outer edge of the color resistanceunit to the first metal layer and / or second metal layer. Reducing the difference in the topographic segment at the outer edge of the COA array base plate, thus reducing the thickness of the photoresist coating on the outside edge of the color resistance cell when graphing the transparent conductive layer, making it easy to be removed through the exposure and development; In addition, the first metal layer and the second metal layer have reflective characteristics, which can improve the exposure effect, so that the photoresist coating on the outer edge of the color-resistance cell is fully exposed and removed by the exposure and development; the COA-type array substrate of the invention may eliminate or reduce the residual of metal oxide located at the outer edge of the color-resistance cell by the effect of the above two aspects, which avoids the out of control situations of the electrical signal of the pixel electrode.

Description

technical field [0001] The present invention relates to the field of display technology, in particular to a COA type array substrate. Background technique [0002] Liquid crystal display (Liquid Crystal Display, LCD) has many advantages such as thin body, power saving, and no radiation, and has been widely used, such as: mobile phones, personal digital assistants (PDA), digital cameras, computer screens and notebook computers screen etc. [0003] Most of the liquid crystal display devices currently on the market are backlight liquid crystal display devices, which include a housing, a liquid crystal panel disposed in the housing, and a backlight module disposed in the housing. The structure of a traditional liquid crystal panel is composed of a color filter substrate (Color Filter), a thin film transistor array substrate (Thin Film TransistorArray Substrate, TFT Array Substrate), and a liquid crystal layer (Liquid Crystal Layer) arranged between the two substrates. , its wo...

AI Technical Summary

Problems solved by technology

[0008] The color color resist layer 300 includes several color resist units 310 arranged at intervals, the several color resist units 310 respectively correspond to the several pixel electrodes 410 up and down, and the outer edges of the several color resist units 310 respectively exceed For the outer edges of the plurality of pixel electrodes 410, since the color-resist unit 310 is thicker, a relatively large topographical level difference is likely to appear on the COA-type array substrate corresponding to the outer edge of the color-resist unit 310. When the transparent conductive layer 400 made of metal oxide material is formed on the color resist layer 300, the photoresist is easily deposited at the position corresponding to the outer edge of the color resist unit 310 to form a thick film, which cannot be removed after exposure and development (ie, exposure Incomplete), the metal oxide under the photoresist cannot be removed by etching, and finally a metal oxide residual line 600 appears on the side of the pixel electrode 410. When the metal oxide residual line 600 connects the pixel electrode 410 and When the horizontal electrode 4210 in the first light-shielding common electrode 420 is used, the electrical signal of the pixel electrode 410 cannot be controlled.

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