1270results about How to "Fully removed" patented technology

The present invention comprises electrosurgical apparatus and methods for maintaining patency in body passages subject to occlusion by invasive tissue growth. The apparatus includes an electrode support disposed at a shaft distal end having at least one active electrode arranged thereon, and at least one return electrode proximal to the at least one active electrode. In one embodiment, a plurality of active electrodes each comprising a curved wire loop portion are sealed within a distal portion of the electrode support. The apparatus and methods of the present invention may be used to open and maintain patency in virtually any hollow body passage which may be subject to occlusion by invasive cellular growth or invasive solid tumor growth. Suitable hollow body passages include ducts, orifices, lumens, and the like, with exemplary body passages including the coronary arteries. The present invention is particularly useful for reducing or eliminating the effects of restenosis in coronary arteries by selectively removing tissue in-growth in or around stents anchored therein.

The present invention provides skin grafting and devices that comprise a systematic approach to the process of skin grafting, i.e., harvesting, post-excision processing and application of donor skin and pre and post-graft treatment of the recipient site.

A pulse rate sensor that includes an accelerometer for measuring periodic motion and a piezo sensor for detecting erratic motion is capable of more accurately determining pulse rate by accounting for these types of motion. The pulse rate sensor in accordance with the present invention diminishes pulse rate signal degradation due to erratic motion through a combination of algorithms that control signal boosting, waveform refinement and signal noise suppression.

The invention provides a method to form a pattern of functional material on a substrate. The method uses an elastomeric stamp having a relief structure with a raised surface and having a modulus of elasticity of at least 10 MegaPascal. At least the raised surface of the stamp is treated by exposing the stamp to heat, radiation, electrons, a stream of charged gas, chemical fluids, chemical vapors, and combinations thereof, to enhance wettability of the surface. A composition of the functional material and a liquid is applied to the relief structure and the liquid is removed to form a film on the raised surface. The elastomeric stamp transfers the functional material from the raised surface to the substrate to form a pattern of the functional material on the substrate. The method is suitable for the fabrication of microcircuitry for electronic devices and components.

Accordingly, a broad object of the invention can be to provide an inventive implant to facilitate stabilization while allowing an amount of motion of a sacroiliac joint. Embodiments of the sacroiliac joint implant can provide an elongate body, which can further include at least one fixation member, or a pair of fixation members which extend a distance outward from the longitudinal axis of the implant body adapted for non-transverse placement between the articular surfaces of the sacroiliac joint, and as to certain embodiments can further provide a third fixation member and additionally a fourth fixation member each adapted to extend a distance outward from the elongate body into the bone of the sacrum or the ilium.

A method of making hydrogenated Group IVA compounds having reduced metal-based impurities, compositions and inks including such Group IVA compounds, and methods for forming a semiconductor thin film. Thin semiconducting films prepared according to the present invention generally exhibit improved conductivity, film morphology and/or carrier mobility relative to an otherwise identical structure made by an identical process, but without the washing step. In addition, the properties of the present thin film are generally more predictable than those of films produced from similarly prepared (cyclo)silanes that have not been washed according to the present invention. The present invention advantageously provides semiconducting thin film structures having qualities suitable for use in electronics applications, such as display devices or RF ID tags, while enabling high-throughput manufacturing processes that form such thin films in seconds or minutes, rather than hours or days as with conventional photolithographic processes.

Provided is a trap apparatus, disposed in an exhaust passage 22 for discharging an exhaust gas from a processing chamber 10 for processing a wafer W, thereby to trap exhaust from the exhaust gas, so that the exhaust trapped by a trap element can be efficiently removed to regenerate the trap element. The trap apparatus includes a housing 42 disposed in the exhaust passage, a trap element 48 disposed in the housing for trapping the exhaust, a trap heating unit 54 for heating the trap element, a coolant introducing unit 60 for introducing a coolant into the housing, a coolant discharging unit 62 for discharging the coolant from the housing, and a controller 88 which performs a control to introduce the coolant from the coolant introducing unit into the housing, while the trap element being heated by the trap heating unit, to remove the exhaust trapped by the trap element.

An information terminal device has a touch panel and a display unit which are integrally configured, and an operation button provided around the display unit, and the information terminal device includes: a touch number counting unit operable to count number of times of touching the operation button; a touch number storing unit operable to store the number of times counted by the touch number counting unit; and a control unit operable to control the information terminal device by switching an operation mode between a normal mode for working the information terminal device according to operations of the touch panel and the operation button and a cleaning mode for cleaning the touch panel, wherein in the cleaning mode, the control unit prohibits an application from being executed according to operations of the touch panel and the operation button, and terminates the cleaning mode when the number of times of touching the operation button counted by the touch number counting unit reaches a predetermined number.

A closure assembly structured for use with a female luer connector and operative to indicate an accomplished or attempted tampering thereof. A connector cover is movably and removably disposed within a housing and includes an interior chamber disposed and structured to receive an access port of the female connector. An indicator member is removably connected to an interior of the housing in surrounding relation to the connector cover and a drive assembly associated with both the connector cover and the housing is operable to concurrently rotate and axially advance the interior chamber into enclosing relation to the access port. Attempted removal of the housing from the female connector, such as by an applied axial force to the housing, will detach the indicated member from the housing and dispose it in a visually observable position surrounding the connector cover, thereby indicating attempted access.

The invention provides a method to form a pattern of a functional material on a substrate. The method uses an elastomeric stamp having a relief structure with a raised surface and having a modulus of elasticity of at least 10 MegaPascal. A liquid composition of the functional material and a liquid is applied to the relief structure and the liquid is removed to form a film on the raised surface. The elastomeric stamp transfers the functional material from the raised surface to the substrate to form a pattern of the functional material on the substrate. The method is suitable for the fabrication of microcircuitry for electronic devices and components.

Provided is an in-situ precleaning method for use in conjunction with epitaxial processes that utilizes temperatures at or below those typically utilized during the subsequent epitaxial deposition under pressure and ambient conditions suitable for inducing decomposition of semiconductor oxides, such as native oxides, from exposed semiconductor surfaces. The reduced temperature and the resulting quality of the cleaned semiconductor surfaces will tend to reduce the likelihood of temperature related issues such as unwanted diffusion, autodoping, slip, and other crystalline stress problems while simultaneously reducing the overall process time. The combination of pressure, ambient gas composition and temperature maintained within the reaction chamber are sufficient to decompose semiconductor oxides present on the substrate surface. For example, the reaction chamber may be operated so that the concentration of evolved oxygen within the reaction chamber is less than about 50%, or even less than 10%, of the equilibrium vapor pressure under the cleaning conditions.

An apparatus for endodontic treatment, comprising: a nozzle connected to a fluid source comprising: a tip small enough to be inserted into a pulp chamber of a tooth; an inner geometry which forms a flow parameters including non-axial flow direction of nozzle fluid flowing through the inner geometry such that discharge fluid discharged from the inner geometry increase rotation of root canal fluid within a root canal sufficiently to remove tissue from the root canal.

The invention relates to a method for manufacturing impregnant bitumen. The method comprises the following steps: aliphatic hydrocarbon solvent and aromatic hydrocarbon solvent are selected to make mixed solvent; mid-temperature coal pitch or coal tar maltha and the mixed solvent are fed in at least three stages of mixers in a certain proportion, and then are fed in an extracting tower for separation after fully mixing; light phase bitumen and heavy phase bitumen with less quinoline insoluble content are extracted for separation inside the extracting tower; and the impregnant bitumen is obtained through the steam stripping of the light phase bitumen inside a stripping tower. The method makes use of equipment with simple structure, and bitumen blockage is not easy to occur; moreover, the method can realize continuous industrial production of high-quality impregnant bitumen, and reduces cost.

The invention relates to a circuit board unit and a method for production thereof. The circuit board unit comprises a circuit board topmost laminate with conductive tracks on the upper side for mounting surface-mountable devices. The circuit board topmost laminate features a thickness dimensioned such that the anticipated heat dissipated by the surface-mountable devices is transported from the upper side to the underside of the circuit board laminate to good effect. The circuit board unit further comprises an electrically insulating laminate arranged under the circuit board topmost laminate, inserts made of a material with good heat conductivity and electrical insulation embedded in the electrically insulating laminate at sites below surface-mountable devices with high heat dissipation, and a cooling plate arranged below the electrically insulating laminate and the inserts.

A highly efficient method for cleaning a substrate, whereby in the cleaning of the substrate, ① in a short time, {circle around (2)} both particle contaminants and metal contaminants can be removed, and ③ a problem associated therewith, such as re-deposition of contaminants or a dimensional change due to etching, can be remarkably reduced, and which has the following characteristics.

A method for cleaning a surface of a substrate, which comprises at least the following steps (1) and (2), wherein the step (2) is carried out after carrying out the step (1):

Step (1): A cleaning step of cleaning the surface of the substrate with an alkaline cleaning agent containing a completing agent, and

Step (2): A cleaning step employing a cleaning agent having a hydrofluoric acid content C (wt %) of from 0.03 to 3 wt %, wherein the cleaning time t (seconds) of the substrate with said cleaning agent is at most 45 seconds, and C and t satisfy the relationship of 0.25≦tC^1.29≦5.

Methods for cleaning and regenerating a working electrode in an electrochemical cell; method for measuring the concentration of a metal in a liquid sample in an electrochemical cell having a working electrode, the method including a step for cleaning and/or regenerating the electrode; and an assembly having an ultrasonic device in sonic communication with an electrochemical cell.