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Wafer level metal shielded packaging structure and manufacturing method thereof

A technology of metal shielding and packaging structure, which is applied in semiconductor/solid-state device manufacturing, electrical components, electric solid-state devices, etc., and can solve the problems of increasing operation restrictions, increasing production costs, and tediousness

Inactive Publication Date: 2018-06-29
SIGURD MICROELECTRONICS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This manufacturing process increases the restrictiveness of the operation and is relatively cumbersome. In addition to affecting the yield, it will also increase the production cost and prolong the production cycle; in addition, because the additional conductive bumps 3 are arranged around the chip unit 2, the volume of the component increases. Large, but also affect the cost and pass rate

Method used

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  • Wafer level metal shielded packaging structure and manufacturing method thereof
  • Wafer level metal shielded packaging structure and manufacturing method thereof
  • Wafer level metal shielded packaging structure and manufacturing method thereof

Examples

Experimental program
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Embodiment Construction

[0016] Such as figure 2 Shown is a cross-sectional view of a wafer-level metal shield package structure according to an embodiment of the present invention. The wafer-level metal-shielded packaging structure includes a substrate 10 , a chip unit 12 , a first conductive structure 14 , a second conductive structure 16 , a packaging adhesive layer 18 and a metal shielding layer 20 .

[0017] Wherein, the substrate 10 can be a printed circuit board or a silicon wafer substrate, and has a plurality of ground portions 11 on its surface. The chip unit 12 is arranged above the substrate 10, and it can be a fan-in structure or a fan-out structure; here, the lower surface of the chip unit 12 is defined as the front surface, the upper surface of the chip unit 12 is the back surface, and The surface is a side surface. The first conductive structure 14 is arranged on the surface of the substrate 10 and is located on the front surface of the chip unit 12. The first conductive structure 1...

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PUM

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Abstract

The invention discloses a wafer level metal shielded packaging structure and a manufacturing method thereof. According to the method, in the re-routing and bump manufacturing process, a first conductive structure electrically connected with a chip unit is formed, the front surface of the chip unit is further provided with one or more second conductive structures at the position adjacent to the side surface, the second conductive structures are not conducted with a circuit of the chip unit, a metal shielding layer connected with the second conductive structures is formed at the back and the side edges of the chip unit after the chip unit is cut, the chip unit can be directly installed on a substrate, the second conductive structures are enabled to be electrically connected with a groundingstructure of the substrate, and the metal shielding layer is connected so as to generate a metal shielding effect, so that elements can be effectively prevented from being subjected to electromagneticinterference, and a purpose of reducing the size of the elements is achieved at the same time.

Description

technical field [0001] The invention relates to a wafer-level chip-scale package (WLCSP) structure, in particular to a wafer-level metal-shielded package structure and a manufacturing method thereof which have a metal shielding effect and effectively realize component volume reduction. Background technique [0002] The existing wafer-level chip size package (WLCSP) is applied to the anti-electromagnetic wave design of reducing electromagnetic interference (EMI), mainly after the active and passive components are placed on the board, and the active and passive components are molded with plastic materials. Cover, and then use metal sputtering or add a metal cover to cover it and connect it to the ground wire to achieve EMI protection. These technologies will increase the thickness and volume of the finished product. For existing 3C products and wearable devices, the volume requirements are very high, which does not meet the trend and demand of light, thin and short. [0003] ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L23/552H01L23/31H01L21/98
CPCH01L23/552H01L24/97H01L23/3114H01L2924/3025H01L2224/16227H01L2224/12105H01L2224/96
Inventor 叶灿鍊沈宽典庞思全王惟平
Owner SIGURD MICROELECTRONICS CORP
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