Manufacturing method of color filtering substrate

Abstract

The invention relates to a manufacturing method of a color filtering substrate. The manufacturing method comprises the following steps: providing a current substrate which comprises a plurality of frame regions, wherein the frame regions covered by primary laser of exposure equipment is a first region; and in the first region, at least one frame region is a non-screen region while other frame regions are screen regions; in the first region, forming a testing structure in the non-screen region while forming a functional structure in the screen region; and obtaining the size relationship betweenthe actual line width and a preset line width of the functional structure. According to the manufacturing method of the color filtering substrate provided by the invention, the size relationship between the actual line width and the preset line width of the functional structure can be obtained more simply and rapidly, so that the actual line width of the functional structure can be more effectively controlled.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing, in particular to a method for manufacturing a color filter substrate. Background technique [0002] Liquid crystal display devices are rapidly spreading not only in the field of information and communication equipment but also in the field of general electrical equipment due to their portability and excellent display performance. [0003] A liquid crystal display device generally includes: an array substrate, on which there are usually a plurality of pixel electrodes arranged in a matrix; a color filter substrate, which usually includes a plurality of color photoresists; sealed between the array substrate and the color filter substrate between the LCD. [0004] With the improvement of the resolution of liquid crystal display devices, the line width of each structure on the color filter substrate (usually this line width is equal to the critical dimension of the process, critical dimens...

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Problems solved by technology

[0004] With the improvement of the resolution of liquid crystal display devices, the line width of each structure on the color filter substrate (usually this line width is equal to the critical dimension of the process, critical dimension, CD) is getting smaller and smaller. In the production process, it is necessary to search for each structure It is becoming more and more difficult whether the line width of the line width meets the requirements and whether the position of the corresponding structure is shifted, which brings great challenges to the manufacturing process of the color filter substrate.

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