Negative type photosensitive resin composition for black matrix, black matrix, color filter, and liquid crystal display element

A technology of photosensitive resin and black matrix, which is applied in the direction of photosensitive materials, optics, and optomechanical equipment used in optomechanical equipment. It can solve the problems of developing residue and poor adhesion, and achieve the improvement of developing residue and poor adhesion. good effect

Active Publication Date: 2018-07-03
CHI MEI CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0011] In view of this, the present invention provides a negative photosensitive resin composition for a black matrix of a color filter, using the negative photosensitive resin The black matrix prepared by the composition can improve the above problems of developing residue and poor adhesion of the black matrix

Method used

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  • Negative type photosensitive resin composition for black matrix, black matrix, color filter, and liquid crystal display element
  • Negative type photosensitive resin composition for black matrix, black matrix, color filter, and liquid crystal display element
  • Negative type photosensitive resin composition for black matrix, black matrix, color filter, and liquid crystal display element

Examples

Experimental program
Comparison scheme
Effect test

Synthetic example A-1-1

[0168] Into a flask equipped with a stirring device, a dropping funnel, a condenser, a thermometer, and a gas introduction tube, 262.0 g of propylene glycol monomethyl ether acetate (PGMEA) was added, stirred while replacing nitrogen, and the temperature was raised to 120°C.

[0169] Next, in a mixture of isopropyl acrylate 5.70g (0.05 mole), glycidyl methacrylate 121g (0.85 mole), dicyclopentanyl methacrylate 13.2g (0.06 mole) and methyl methacrylate 4.00g (0.04 mol) to the monomer mixture composed of 19.0 g of tert-butylperoxy-2-ethylhexanoate (polymerization initiator, manufactured by NOF Corporation, Perbutyl O), and the resulting It was added dropwise to the aforementioned flask over 2 hours. After completion of the dropwise addition, stirring was carried out at 120° C. for 2 hours to conduct a copolymerization reaction to produce an addition copolymer. Then, the inside of the flask was replaced with air, and 73.2 g (0.85 mol) of methacrylic acid, 0.6 g of triphenylphosp...

Synthetic example A-2-1

[0175] Into a flask equipped with a stirring device, a dropping funnel, a condenser, a thermometer, and a gas introduction tube, 262.0 g of propylene glycol monomethyl ether acetate (PGMEA) was added, stirred while replacing nitrogen, and the temperature was raised to 120°C.

[0176] Secondly, by α-methylstyrene 45.8g (0.16 mol), glycidyl methacrylate 107g (0.75 mol), dicyclopentenyl oxygen ethyl methacrylate 18.5g (0.07 mol) and In the monomer mixture that bornene 1.88g (0.02 mole) forms, add the tertiary butylperoxy-2-ethylhexanoate of 19.0g (polymerization initiator, NOF company manufacture, PerbutylO), the gained Those were added dropwise to the aforementioned flask from the dropping funnel over 2 hours. After completion of the dropwise addition, stirring was carried out at 120° C. for 2 hours to conduct a copolymerization reaction to produce an addition copolymer. Then, the inside of the flask was replaced with air, and 50.4 g (0.7 mol) of acrylic acid, 0.6 g of triphenylp...

Synthetic example A-3-1

[0188] Into a flask equipped with a stirring device, a dropping funnel, a condenser, a thermometer, and a gas introduction tube, 267.5 g of propylene glycol monomethyl ether acetate (PGMEA) was added, stirred while replacing nitrogen, and the temperature was raised to 120°C.

[0189] Next, by 55.3g (0.3 mole) of 2-ethylhexyl acrylate, 17.2g (0.2 mole) of methacrylic acid, 11.0g (0.05 mole) of dicyclopentyl methacrylate, 25.0g (0.05 mole) of methyl methacrylate ( 0.25 mol) and benzyl methacrylate 35.2g (0.2 mol) monomer mixture, add 19.2g of tertiary butyl peroxy-2-ethylhexanoate (polymerization initiator, NOF Preparation, Perbutyl O), the resultant was added dropwise to the aforementioned flask from the dropping funnel over 2 hours. After completion|finish of dripping, it stirred at 120 degreeC for 2 hours, and performed copolymerization reaction, and obtained another alkali-soluble resin (A-3-1).

[0190] Examples and Comparative Examples of Negative Photosensitive Resin Com...

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Abstract

The invention provides a negative type photosensitive resin composition for a black matrix, a black matrix, a color filter, and a liquid crystal display element. The prepared black matrix does not have any development residue and has excellent adherence. The negative type photosensitive resin composition comprises alkali soluble resin (A), a compound containing an ethylene unsaturated group (B), aphoto-initiator (C), a solvent (D), and a black pigment (E). The alkali soluble resin (A) comprises alkali soluble resin (A-1) containing a special group and alkali soluble resin (A-2) containing a special group.

Description

technical field [0001] The invention relates to a negative-type photosensitive resin composition for a black matrix, a black matrix, a color filter and a liquid crystal display element, in particular to a negative-type photosensitive resin for a black matrix that can reduce residue and improve adhesion A resin composition, a black matrix made from the negative photosensitive resin composition for a black matrix, a color filter including the black matrix, and a liquid crystal display element including the color filter. Background technique [0002] In recent years, with the vigorous development of various liquid crystal display device technologies, in order to improve the contrast and display quality of current liquid crystal display devices, stripes (Stripe) and dots (stripes) of color filters in liquid crystal display devices are usually added Dot) place a black matrix (Black Matrix) in the gap. The above-mentioned black matrix can prevent problems such as a decrease in co...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/038G03F7/027G03F7/004G02F1/1335
CPCG02F1/133512G02F1/133514G03F7/004G03F7/027G03F7/038
Inventor 朱振忠廖豪伟蔡宇杰萧君佑
Owner CHI MEI CORP
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