Light-emitting diode chip structure and manufacturing method thereof

A technology of light-emitting diode and chip structure, applied in semiconductor devices, electrical components, circuits, etc., can solve the problems of reduced luminous efficiency, low light extraction from the outside of the light-emitting diode chip, etc., to improve brightness, improve poor adhesion problems, The effect of enhancing reliability

Active Publication Date: 2022-04-15
QUANZHOU SANAN SEMICON TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In view of the shortcomings of the prior art described above, the purpose of the present invention is to provide a light-emitting diode chip structure and its manufacturing method, which are used to solve the problem of low light extraction from the outside of the light-emitting diode chip in the prior art, resulting in reduced luminous efficiency.

Method used

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  • Light-emitting diode chip structure and manufacturing method thereof
  • Light-emitting diode chip structure and manufacturing method thereof
  • Light-emitting diode chip structure and manufacturing method thereof

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Embodiment Construction

[0039] The embodiments of the present invention are described below through specific specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the contents disclosed in this specification. The present invention can also be implemented or applied through other different specific embodiments, and various details in this specification can also be modified or changed based on different viewpoints and applications without departing from the spirit of the present invention.

[0040] see Figure 1~Figure 10 . It should be noted that the diagrams provided in this embodiment are only to illustrate the basic concept of the present invention in a schematic way, so the diagrams only show the components related to the present invention rather than the number, shape and the number of components in the actual implementation. For dimension drawing, the type, quantity and proportion of each component can be changed at will ...

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Abstract

The invention provides a light-emitting diode chip structure and a manufacturing method thereof. The structure includes: a substrate; a light-emitting epitaxial structure located on the substrate, including a first conductivity type semiconductor layer, a quantum well layer and a second conductivity type semiconductor layer stacked in sequence. A semiconductor layer; a current spreading layer, formed on part of the surface of the epitaxial structure; an insulating layer, wrapping the sidewall of the current spreading layer, and the insulating layer has a series of patterned through-hole structures; a metal layer, formed on the On the surface of the insulating layer, the part of the metal layer is in contact with the transparent conductive layer through a part of the through-hole structure, and the other part of the metal layer is in contact with the light-emitting epitaxial structure through a part of the through-hole structure.

Description

technical field [0001] The invention belongs to the field of semiconductor lighting, and in particular relates to a light emitting diode chip structure and a manufacturing method thereof. Background technique [0002] As a new type of high-efficiency solid light source, semiconductor lighting has significant advantages such as long life, energy saving, environmental protection, and safety. It will become another leap in the history of human lighting after incandescent lamps and light lamps. The upgrading of display and other industries has huge economic and social benefits. Because of this, semiconductor lighting is generally regarded as one of the most promising emerging industries in the 21st century, and it is also one of the most important commanding heights in the field of optoelectronics in the next few years. Light-emitting diodes (LED for short) are usually made of semiconductors such as GaN (gallium nitride), GaAs (gallium arsenide), GaP (gallium phosphide), GaAsP ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L33/38H01L33/44H01L33/46
CPCH01L33/46H01L33/06H01L33/145H01L33/62H01L33/10H01L33/38H01L33/44H01L33/00H01L33/382H01L33/405H01L33/42H01L2933/0016H01L2933/0025
Inventor 刘小亮何安和彭康伟林素慧洪灵愿张家宏
Owner QUANZHOU SANAN SEMICON TECH CO LTD
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