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A kind of preparation method of chitosan-poly 2-acrylamido-2-methylpropanesulfonate sodium copolymer used for monocrystalline silicon wool

A technology of sodium methylpropanesulfonate and acrylamide, which is applied in the field of preparation of chitosan-poly 2-acrylamide-2-sodium methylpropanesulfonate copolymer, can solve the problem that chitosan cannot be used, It can achieve the effect of uniform four-sided pyramid on the single crystal silicon wafer, low reflectivity, and improved deposition ability.

Active Publication Date: 2020-10-09
温岭汉德高分子科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, according to a large number of open literature reports and the applicant's test, because the molecular weight structure of chitosan is rigid, there is a strong hydrogen bond between its molecules, and chitosan can only be dissolved in slightly acidic aqueous solution. will be precipitated in the environment
The texturing process is carried out in a strong alkaline environment, therefore, chitosan cannot be directly used in the texturing process of monocrystalline silicon wafers or the actual effect is not good

Method used

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  • A kind of preparation method of chitosan-poly 2-acrylamido-2-methylpropanesulfonate sodium copolymer used for monocrystalline silicon wool
  • A kind of preparation method of chitosan-poly 2-acrylamido-2-methylpropanesulfonate sodium copolymer used for monocrystalline silicon wool

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Experimental program
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Effect test

Embodiment 1

[0038] Preparation of chitosan-poly 2-acrylamide-2-methylpropanesulfonate sodium copolymer: 10g of chitosan with a molecular weight of 30000 and a degree of deacetylation of 54% was dissolved in 500mL of deionized water and placed under nitrogen protection Next, add 10g cerium ammonium nitrate and 30g sodium 2-acrylamido-2-methylpropanesulfonate successively; raise the temperature to 60°C, react for 6h, then place the reaction system in a dialysis bag with a molecular weight cut-off of 15000Da, and remove After dialysis in deionized water for 3 days, the copolymer was collected by lyophilization.

[0039] Preparation of texturing additives: 2.5% chitosan-poly 2-acrylamide-2-methylpropanesulfonate sodium copolymer, 0.5% methylglycinediacetic acid sodium, 3-methoxy-3- Dissolve 5% methyl-1-butanol and 0.1% phenoxyethanol in the remaining water and mix well.

[0040] Preparation of texturing liquid: add the above-mentioned prepared texturing additive to the alkaline solution and ...

Embodiment 2

[0043] Preparation of chitosan-poly 2-acrylamido-2-methyl propane sulfonate copolymer: 5g of chitosan with a molecular weight of 50,000 and a degree of deacetylation of 55% was dissolved in 500mL of deionized water, Under protection, 6g of cerium ammonium nitrate and 25g of sodium 2-acrylamido-2-methylpropanesulfonate were added successively; the temperature was raised to 50°C and reacted for 4h, and then the reaction system was placed in a dialysis bag with a molecular weight cut-off of 20,000Da, After dialysis in deionized water for 5 days, the copolymer was collected by lyophilization.

[0044] Preparation of texturizing additives: 1.5% chitosan-poly 2-acrylamide-2-methylpropanesulfonate sodium copolymer, 1.0% methyl glycine diacetate sodium, 3-methoxy-3- Dissolve 10% methyl-1-butanol and 0.05% phenoxyethanol in the remaining water, and mix well.

[0045] Preparation of texturing liquid: add the above-mentioned prepared texturing additive to the alkaline solution, and mix ...

Embodiment 3

[0048] Preparation of chitosan-poly 2-acrylamido-2-methyl propane sulfonate copolymer: 15g of chitosan with a molecular weight of 10000 and a degree of deacetylation of 52% was dissolved in 500mL of deionized water and heated in helium Under protection, 6g of cerium ammonium nitrate and 15g of sodium 2-acrylamido-2-methylpropanesulfonate were added successively; the temperature was raised to 80°C, and the reaction was carried out for 24 hours. After dialysis in deionized water for 2 days, the copolymer was collected by lyophilization.

[0049] Preparation of texturizing additives: 5% of the above-mentioned chitosan-poly 2-acrylamido-2-methylpropanesulfonate sodium copolymer, 0.1% of sodium methylglycinediacetate, 3-methylpropanediacetate in a certain mass percentage 5% of oxy-3-methyl-1-butanol and 0.5% of phenoxyethanol were dissolved in the rest of the water and mixed evenly.

[0050] Preparation of texturing solution: add the above-mentioned prepared texturing additive to ...

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Abstract

The invention relates to the field of the preparation of monocrystalline silicon wafers, and discloses a preparation method of a chitosan-poly-2-acryloylamino-2-sodium methylpropyl sulfonate copolymerfor the surface texturing of monocrystalline silicon. The preparation method comprises the following steps of dissolving chitosan in deionized water, and under the protection of an inert gas, addingammonium ceric nitrate and 2-acryloylamino-2-sodium methylpropyl sulfonate in sequence; raising a temperature, reacting, then putting a reaction system into a dialysis bag, dialyzing in the deionizedwater, afterwards, freeze-drying, and collecting to obtain the copolymer. According to the preparation method, the chitosan-poly2-acryloylamino-2-sodium methylpropyl sulfonate copolymer prepared by the method is used for the surface texturing of the monocrystalline silicon; the preparation method is green and environment-friendly in material; further, the copolymer can be used for obviously improving the sedimentary ability, on the surface of a silicon wafer, of the copolymer on the premise that the deaeration effect of the copolymer is not influenced; an optimized textured-surface pyramid structure is maintained; tetrahedral square cones on a monocrystalline silicon wafer obtained after being subjected to the surface texturing are enabled to be uniform, and the reflectivity of the siliconwafer is low.

Description

technical field [0001] The invention relates to the field of monocrystalline silicon wafer preparation, in particular to a preparation method of chitosan-poly 2-acrylamide-2-methylpropanesulfonate copolymer used for monocrystalline silicon texturing. Background technique [0002] The process of forming countless tetrahedral pyramids on the surface of a single crystal silicon wafer, such as (110) and (111) planes, has a different corrosion rate in an alkaline solution, which is often called texturing. It is called "surface texturing". The formed four-sided pyramid similar to the "pyramid" structure can effectively reduce the reflectivity of the silicon wafer to light. The lower the light reflection of the monocrystalline silicon wafer used for solar cells is, the more the silicon wafer absorbs light, and the higher the energy conversion efficiency of the solar cell is. [0003] However, monocrystalline silicon wafers will quickly generate a large amount of hydrogen gas in a...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08F251/00C08F220/58C30B33/10
CPCC08F251/00C30B33/10C08F220/585
Inventor 蔡国华
Owner 温岭汉德高分子科技有限公司
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