9results about How to "Improve the deposition effect" patented technology

This invention relates to a nickel-plated steel sheet with excellent corrosion resistance for battery casings and a method for manufacturing the same. In one specific embodiment, the nickel-plated steel sheet comprises: a base steel sheet; a nickel plating layer formed on at least one surface of the base steel sheet; and a nickel-iron diffusion layer formed between the base steel sheet and the nickel plating layer. The nickel plating layer and the nickel-iron (Ni-Fe) diffusion layer are formed by heat treatment after forming an electroplated nickel layer on the base steel sheet and a chemically plated nickel layer on at least a portion of the surface of the electroplated nickel layer. The nickel plating layer contains one or more vacancy elements selected from phosphorus (P), boron (B), tungsten (W), cobalt (Co), molybdenum (Mo), and copper (Cu) on its surface.

The utility model provides a kind of farmland type ecological buffer zone structure, it is related to agricultural ecological environment management technical field, including land buffer area one, ecological regulation pond, land buffer area two and concave green land, land buffer area one, ecological regulation pond, land buffer area two and concave green land are sequentially distributed from farmland side to river embankment side, land buffer area one and land buffer area two are planted with arbor shrub and grass flower mat, the ecological regulation pond is sequentially provided with impermeable layer, adsorption layer and plant layer from bottom to top, the concave green land is laid with buffer base, the concave green land is planted with herbaceous plant and shrub. This structure effectively intercepts farmland non-point source pollution, reduces river pollutant, helps to strengthen river self-purification capacity, promotes aquatic animal and plant diversity development, and guarantees ecological benefit to play well.

The utility model discloses a building sewage treatment device and relates to the technical field of sewage treatment. The device comprises a cylinder body, a deposition mechanism is arranged in the cylinder body, a dredging mechanism is arranged on the inner side of the deposition mechanism, the deposition mechanism comprises a first-stage deposition tank, a second-stage deposition tank and a third-stage deposition tank, and the first-stage deposition tank, the second-stage deposition tank and the third-stage deposition tank are sequentially arranged in the cylinder body. A water inlet is formed in the inner wall of one side of the first-stage deposition tank, a first-stage circulation opening is formed in the inner wall of the other side of the first-stage deposition tank, a deposition pond is fixedly arranged on the lower inner wall of the second-stage deposition tank, the inner wall of one side of the deposition pond is fixedly connected with the first-stage circulation opening, and a plurality of filtering openings are formed in the outer side of the deposition pond; according to the utility model, through the deposition mechanism, multi-stage deposition treatment can be realized, the sewage deposition effect is improved, sewage is fully deposited in each deposition tank, impurities such as silt in the sewage are effectively removed, and the sewage treatment quality is improved.

The application provides a high-efficiency preparation process of short-fiber hard thermal insulation composite material: carbon fibers with short fibers as raw materials are immersed in a modifier for surface treatment, then metal modification, carbon layer deposition and inorganic layer coating are sequentially performed on the surface; the carbon fibers and inorganic materials are compounded and hot-pressed, and then high-temperature graphitization treatment is performed, so that the short-fiber hard thermal insulation composite material is obtained. The process can improve the connection strength between the short fibers and the inorganic materials, improve the mechanical properties of the composite material, and has higher graphitization degree and good thermal insulation performance.

The application provides a brightener, a preparation method and application thereof. The brightener has a structure as shown in formula 1, wherein R is any one of CH3-(CH2) x -, Ph-(CH2) y - or an azacyclic group, x is 2-5, and y is 0-4. The brightener is connected with a functional group having strong polarity, has good inhibition effect on copper, and has a capturing cuprous ion at the other end of the structure, accelerates copper deposition, has certain leveling performance, can form leveling effect on the surface copper high potential, forms acceleration effect on the low point position in the hole, and can effectively improve the deep plating capacity of the acid copper plating solution, and the deep plating capacity can reach 79-85%.

The invention discloses a longitudinal spiral HFCVD diamond deposition system and a deposition method.The deposition system comprises a plurality of spiral lamp filaments located on the side of a base body, the spiral lamp filaments are arranged in the vertical direction and distributed at equal intervals in the transverse direction, the two ends of each spiral lamp filament are connected with a pre-stretching structure, and the two ends of each spiral lamp filament are connected with the corresponding pre-stretching structure; one side of the spiral filament away from the substrate is connected with the supporting structure; the pre-stretching structure comprises a plurality of molybdenum elastic pieces distributed at equal intervals in the transverse direction, one end of each molybdenum elastic piece is connected with the end of the spiral lamp filament, the other end of each molybdenum elastic piece is installed on the insulating piece through a fixing screw, and gaps with adjustable sizes are formed between the molybdenum elastic pieces and the insulating piece. The supporting structure comprises a plurality of supporting molybdenum sheets which are distributed at equal intervals in the vertical direction. According to the longitudinal spiral type HFCVD diamond deposition system and method, the deposition performance is remarkably improved through a longitudinal spiral type filament structure, the system reliability and the process stability are enhanced, and large-area uniform deposition can be achieved.

The utility model relates to a boat support, a bearing assembly and a deposition device. The boat support comprises two end plates and two side plates, the two end plates are arranged at intervals in the length direction of the boat support, first air inlet holes are formed in the end plates, the two side plates are arranged at intervals in the width direction of the boat support, the side plates are connected between the two end plates, and the two side plates and the two end plates jointly define a mounting space continuously extending in the length direction of the boat support. A plurality of second air inlet holes and a plurality of limiting grooves are formed in the side plates, all the second air inlet holes and the limiting grooves in the side plates are formed in the length direction of the boat support at intervals, the first air inlet holes, the second air inlet holes and the limiting grooves communicate with the installation space, and the limiting grooves are used for limiting a butt strap of the boat body. According to the boat support, the bearing assembly and the deposition device, the deposition effect can be improved.

This disclosure provides a gas processing apparatus and a semiconductor processing apparatus. The gas processing apparatus includes a housing with a receiving cavity. An inlet and an outlet are provided on the housing, and the inlet and outlet communicate with the outside of the housing. The receiving cavity has a connecting separation channel and a collecting cavity. One end of the separation channel communicates with the inlet, and the other end communicates with the collecting cavity, which is connected to the outlet. The separation channel facilitates the separation of dust and gas, thereby improving dust deposition and reducing dust entering the vacuum pump with the gas, thus reducing the impact of dust on the vacuum pump. Therefore, the gas processing apparatus and semiconductor processing apparatus provided by this disclosure facilitate the separation of dust and gas, improve dust deposition, reduce dust entering the vacuum pump with the gas, and thus reduce the impact of dust on the vacuum pump.