Silicon drift detector

A technology of silicon drift detector and detection area, applied in semiconductor devices, electrical components, circuits, etc., can solve the problems of inconvenient use of silicon drift detectors

Active Publication Date: 2018-07-13
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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[0005] The main purpose of this application is to provide a silicon drift detector

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[0031] It should be pointed out that the following detailed description is exemplary and intended to provide further explanation to the present application. Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs.

[0032] It should be noted that the terminology used here is only for describing specific implementations, and is not intended to limit the exemplary implementations according to the present application. As used herein, unless the context clearly dictates otherwise, the singular is intended to include the plural, and it should also be understood that when the terms "comprising" and / or "comprising" are used in this specification, they mean There are features, steps, operations, means, components and / or combinations thereof.

[0033] It will be understood that when an element such as a layer, film, region, or substrate is referred to as ...

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Abstract

The invention provides a silicon drift detector. The silicon drift detector comprises an N type silicon wafer in a detection region, an isolation layer, a plurality of front surface electrodes arranged at intervals, back surface electrodes, and a plurality of partial pressure parts arranged at intervals, wherein a front surface region in the detection region comprises a front surface annular N region and a plurality of front surface annular P regions which are arranged at intervals; a back surface region in the detection region comprises a P type region; the isolation layer is arranged on thefront surface of the N type silicon wafer, and the isolation layer comprises multiple first contact holes formed at intervals; the multiple front surface electrodes comprise negative electrodes and positive electrodes; the negative electrodes are arranged in the corresponding first contact holes connected with the front surface annular P regions in a one-to-one correspondence manner; the positiveelectrodes are arranged in the corresponding first contact holes connected with the front surface annular N region; the back surface electrodes are arranged on the surface of the front surface region,far from the detection region, of the P type region; the multiple partial pressure parts are arranged on the surface, far from the N type silicon wafer, of the isolation layer; the partial pressure parts are positioned on the surface of the isolation layer between two adjacent negative electrodes; the partial pressure parts are electrically connected with adjacent two negative electrodes respectively; and the partial pressure parts are semiconductor partial pressure parts. The detector is simple in operation.

Description

technical field [0001] The present application relates to the field of semiconductors, in particular to a silicon drift detector. Background technique [0002] At present, almost all synchrotron radiation fluorescence experiment stations use Si(Li) detectors for fluorescence analysis. Although the energy resolution meets the requirements, the low count rate severely limits the experimental efficiency. In recent years, Silicon Drift Detector (SDD) has been widely used in energy dispersive X-ray fluorescence spectrometer (XRF) or X-ray energy spectrometer (EDS), medical equipment, high-energy physics due to its high count rate. Research equipment, aerospace. [0003] Silicon drift detector is a relatively advanced device type in semiconductor detectors. It was invented and proposed in 1983 by E.Gatti and P.Rehak on the basis of improving the traditional silicon-based PIN detector. Its main structure is a piece of low-doped high-resistance silicon. There is a thin layer of ab...

Claims

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Application Information

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IPC IPC(8): H01L31/102
Inventor 翟琼华殷华湘贾云丛李贞杰
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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