A chemical vapor deposition device

A technology of chemical vapor deposition and transmission device, which is applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of prolonging production cycle and reducing production efficiency, so as to improve production efficiency and prevent rotation deviation , the effect of shortening the production cycle

Active Publication Date: 2021-01-15
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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  • Abstract
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, since each adjustment needs to cool down and open the reaction chamber, the production cycle is prolonged and the production efficiency is reduced

Method used

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  • A chemical vapor deposition device
  • A chemical vapor deposition device
  • A chemical vapor deposition device

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Embodiment Construction

[0025] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the drawings in the embodiments of the present invention. Apparently, the described embodiments are only some of the embodiments of the present invention, but not all of them. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative efforts fall within the protection scope of the present invention.

[0026] see figure 1 , figure 1 A schematic plan view of a chemical vapor deposition device provided in an embodiment of the present invention.

[0027] An embodiment of the present invention provides a chemical vapor deposition device, including: a reaction chamber 10, and an upper pole plate 101 and a lower pole plate 102 arranged oppositely, and the upper pole plate 101 and the lower pole plate 102 are arranged on the Inside the reaction chamber 10;

[0028] The tr...

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Abstract

The invention provides a chemical vapor deposition device. The device comprises a reaction chamber, an upper polar plate, a lower polar plate and a transmission device; the upper polar plate and the lower polar plate are oppositely arranged; and the transmission device comprises a main body part and a supporting part arranged above the main body part, the transmission device is arranged below thelower polar plate, an adjusting part is arranged on the transmission device, the adjusting part is used for adjusting the position of the lower polar plate to prevent the position of the lower polar plate from rotating and shifting. The adjusting part is arranged on the transmission device, in the actual production process, the adjusting part can directly adjust the position of the lower polar plate so as to achieve the purpose of preventing the position of the lower polar plate from rotating and shifting, in addition, during adjustment, cooling is not needed, and the reaction chamber does notneed to be opened, so that the production cycle is shortened, and the production efficiency is improved.

Description

technical field [0001] The invention relates to the field of chemical vapor deposition, in particular to a chemical vapor deposition device. Background technique [0002] The plasma-enhanced chemical vapor deposition method is to use microwave or radio frequency to ionize the gas containing the constituent atoms of the film to form plasma locally, and the plasma is chemically active and easy to react, thus depositing a film on the substrate. [0003] The ceramic barrel is a transmission device for adjusting the spacing of plasma-enhanced chemical vapor deposition equipment. In the traditional structure, the entire ceramic barrel is a simple rotary body and is fixed on the moving rail by fixing screws; in practical applications, due to the deviation of movement Factors such as movement and mechanical errors cause the substrate to deviate from the ideal position. Therefore, when the substrate is shifted, the existing method is to open the reaction chamber and push the substra...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/50
CPCC23C16/50
Inventor 郭君龙
Owner SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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