Check patentability & draft patents in minutes with Patsnap Eureka AI!

Steady-state crystal growth device

A technology of crystal growth and steady state, applied in crystal growth, single crystal growth, single crystal growth, etc., can solve difficult problems

Inactive Publication Date: 2018-08-07
孟静
View PDF7 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In fact, when controlling the heater to change the thermal field, it still faces the disturbance of the temperature field, so although it can prepare high-quality crystals, it is very difficult

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Steady-state crystal growth device
  • Steady-state crystal growth device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0020] The technical solutions in the embodiments of the present invention are clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0021] In the following description, a lot of specific details are set forth in order to fully understand the present invention, but the present invention can also be implemented in other ways different from those described here, and those skilled in the art can do it without departing from the meaning of the present invention. By analogy, the present invention is therefore not limited to the specific examples disclosed below.

[0022] Such as figure ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a steady-state crystal growth device and relates to the technical field of growth devices of crystals. Crystal growth can be carried out by various manners through the device.The first manner is as follows: a flow speed of a circulating melt keeps constant and the change of growth temperature is controlled through controlling power of a plurality of groups of circulating melt pre-heating heaters. The second manner is as follows: the power of the plurality of groups of circulating melt pre-heating heaters keeps constant and the change of the growth temperature is controlled through controlling the flow speed of the circulating melt. The third manner is as follows: the power of the plurality of groups of circulating melt pre-heating heaters is reduced; meanwhile, theflowing of the circulating melt in a circulating pump is accelerated to control the change of the growth temperature. The fourth manner is as follows: the flow speed of the circulating melt and the power of the circulating melt pre-heating heaters keep constant, and the temperature of a water cooling copper pipe is gradually reduced or the flow speed of cooling liquid in the water cooling copperpipe is gradually increased to control the change of the growth temperature. By adopting the device disclosed by the invention, the melt is not directly heated through the heaters so that a crystal growth process is stable and high-quality crystals are easy to prepare.

Description

technical field [0001] The invention relates to the technical field of monocrystalline silicon preparation devices, in particular to a steady-state crystal growth device. Background technique [0002] Many semiconductor crystals, optical crystals and various functional crystals can be grown as single crystals by the melt method. These single crystal materials are widely used in the fields of laser, communication, navigation and radar. High-quality crystals are the basis for making excellent devices. The smaller the temperature gradient within the single crystal, the slower the growth rate, the smaller the mechanical vibration, and the higher the quality of the crystal. [0003] The usual crystal growth methods include pulling method, crucible descent method (vertical Bridgman method), vertical temperature gradient method, zone melting method, flame melting method, cold crucible condensation shell method, etc. Among them, the vertical temperature gradient method is an excel...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C30B11/00C30B29/52
CPCC30B11/003C30B11/006C30B29/52
Inventor 孟静
Owner 孟静
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More