High-moisturizing cleansing lotion and preparation process thereof

A makeup remover, technology in parts by weight, applied in the field of high moisturizing makeup remover and its preparation technology, can solve the problems of skin irritation, low content of makeup remover active ingredients, and failure to achieve mild effect, etc., achieve good makeup remover ability, improve moisturizing and moisturizing The effect, the effect of good makeup removal effect

Active Publication Date: 2018-08-10
HANGZHOU XINYUE COSMETICS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] In the prior art, the content of water is extremely high, and the content of active ingredients for makeup remover is relatively low. Although it is relatively mild, it can be used for eye makeup removal, bu

Method used

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  • High-moisturizing cleansing lotion and preparation process thereof
  • High-moisturizing cleansing lotion and preparation process thereof
  • High-moisturizing cleansing lotion and preparation process thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0061] Embodiment 1: A kind of highly moisturizing makeup remover, the components included and the corresponding parts by weight are shown in Table 1, and are prepared through the following steps:

[0062] Step 1, fully mixing butylene glycol, dipropylene glycol, and diglycerin to obtain the first mixture;

[0063] Step 2, heating PEG-7 glyceryl cocoate, glyceryl polyether-26, and PEG-8 glyceryl isostearate to 75-85°C, and fully mixing to obtain the second mixture;

[0064] Step 3, adding caprylic acid / capric triglyceride and emollient to the second mixture obtained in step 2 to form a third mixture;

[0065] Step 4, add the third mixture obtained in step 3 to the first mixture obtained in step 1, mix thoroughly, and filter to obtain a high moisturizing makeup remover.

[0066] Among them, emollients

Embodiment 2-3

[0067] Example 2-3: a high moisturizing makeup remover, the difference from Example 1 is that the components included and their corresponding parts by weight are shown in Table 1.

Embodiment 4

[0068] Embodiment 4: a kind of highly moisturizing makeup remover, the difference with embodiment 1 is that the components included and the corresponding parts by weight are as shown in table 1. In step one add glycerin and mix well.

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Abstract

The invention discloses a high-moisturizing cleansing lotion and a preparation process thereof and belongs to the technical field of cleansing products. The high-moisturizing cleansing lotion comprises the following components in parts by weight: 5-25 parts of butanediol, 2-8 parts of dipropylene glycol, 1-15 parts of diglycerol, 3-20 parts of PEG-7 glyceryl cocoate, 1-8 parts of glycereth-26, 1-18 parts of PEG-8 glyceryl isostearate, 2-25 parts of caprylic acid/capric triglyceride and 2-38 parts of a skin moisturizing agent. The high-moisturizing cleansing lotion disclosed by the invention has the advantages of being good in cleansing effect and gentle and non-irritant.

Description

technical field [0001] The invention relates to the technical field of makeup remover, more specifically, it relates to a high moisturizing makeup remover and its preparation process. Background technique [0002] On the one hand, makeup can increase the beauty of women and enhance their self-confidence. On the other hand, it also respects others in terms of social etiquette. [0003] At the same time, makeup removal is also a very important thing. Thoroughly cleansing the skin and removing makeup is the foundation of beauty. If it is not removed thoroughly, the residual cosmetics will cause the pores of the facial skin to be blocked, resulting in imbalanced secretion of oil, water and oil in the skin, thus Causes troublesome skin problems like acne, pimples and blackheads. At the same time, the residue of cosmetics is very harmful to the skin. If it cannot be cleaned in time, it will enter the hair follicles with the breathing of the pores and form cysts. It will be diffic...

Claims

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Application Information

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IPC IPC(8): A61K8/86A61K8/34A61K8/37A61Q1/14A61Q19/00
CPCA61K8/345A61K8/375A61K8/86A61Q1/14A61Q19/00
Inventor 吴依娜张杭城宁德正陈国祥崇桂林
Owner HANGZHOU XINYUE COSMETICS CO LTD
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