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Low-trigger bidirectional silicon-controlled electrostatic protection device with high maintenance voltage

An electrostatic protection device and high sustaining voltage technology, applied in the direction of electric solid devices, electrical components, semiconductor devices, etc., can solve the problems that affect the device's ability to discharge electrostatic current and increase the on-resistance, and achieve excellent ESD window, low Effect of trigger voltage and high sustain voltage

Active Publication Date: 2018-08-28
SUPERESD MICROELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

but increasing R N深阱 The resistance value of the structure will inevitably increase the on-resistance after the structure is fully opened, which will affect the device's ability to discharge electrostatic current.

Method used

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  • Low-trigger bidirectional silicon-controlled electrostatic protection device with high maintenance voltage
  • Low-trigger bidirectional silicon-controlled electrostatic protection device with high maintenance voltage
  • Low-trigger bidirectional silicon-controlled electrostatic protection device with high maintenance voltage

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Experimental program
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Effect test

Embodiment Construction

[0020] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0021] Such as image 3As shown, a low-trigger triac electrostatic protection device with high sustain voltage includes a P-type substrate 100, and an N-type deep well 200 is arranged in the P-type substrate 100; The first P well 301 and the second P well 302 are arranged in sequence from left to right; the first P+ implantation region 601, the second P+ implantation region 401, the first N+ implantation region 401 and the first N+ implantation region are arranged in sequence from left to right in the first P well 301. region 402, wherein the first P+ implantation region 601 spans the first P well 301 and the N-type deep well 200; the second N+ implantation region 501 and the third P+ implantation region 502 are sequentially arranged in the second P well 302 from left to right , the fourth P+ implantation region 602, wherein the fourth P+ implantation ...

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PUM

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Abstract

The invention discloses a low-trigger bidirectional silicon-controlled electrostatic protection device with a high maintenance voltage. The low-trigger bidirectional silicon-controlled electrostatic protection device comprises a P-type substrate, wherein an N deep pit is arranged is arranged in the P-type substrate, a first P well and a second P well are arranged in the N deep pit, a first P+ injection region, a second P+ injection region and a first N+ injection are arranged in the first P well, a second N+ injection region, a third P+ injection region and a fourth P+ injection region are arranged in the second P well, the second P+ injection region and the first N+ injection region are connected and are used as a positive electrode of the device, and the second N+ injection region and the third P+ injection region are connected and used as a negative electrode of the device. The low-trigger bidirectional silicon-controlled electrostatic protection device has the capability of bidirectional electrostatic discharging and can be simultaneously used for electrostatic protection of an input-output pin of an integrated circuit of which a signal level is lower than ground or higher thanthe ground, the device is enabled to have low trigger voltage and also has relatively high maintenance voltage on the premise that no extra area is expanded and the conduction capability of the device is not reduced, so that the device has favorable electrostatic discharge (ESD) window.

Description

technical field [0001] The invention relates to the field of electrostatic protection, in particular to a low-trigger bidirectional thyristor electrostatic protection device with high sustain voltage. Background technique [0002] Electro-Static Discharge (ESD) is an inevitable phenomenon in the process of manufacturing, packaging, testing, transportation, assembly and use of integrated circuits. Static electricity accounts for 30% of the various reasons for the failure of integrated circuits, which poses a serious threat to the reliability of integrated circuits, and electrostatic protection devices can be turned on in time when ESD occurs, providing a parallel low-resistance circuit for the protected integrated circuits The discharge path allows the ESD pulse to pass through the electrostatic protection device, thereby preventing the integrated circuit from being damaged by ESD; in addition, after the ESD occurs, the electrostatic protection device can be turned off in tim...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L27/02
CPCH01L27/0262
Inventor 汪洋关健骆生辉董鹏金湘亮
Owner SUPERESD MICROELECTRONICS TECH CO LTD
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