Surface plasmon-enhanced crater-shaped 3D vertical structure LED structure and preparation method
A surface plasmon, LED structure technology, applied in electrical components, semiconductor devices, circuits, etc., can solve the problems of difficult to avoid metal diffusion, low carrier injection efficiency, affecting the light output efficiency of devices, etc. Effects of light extraction efficiency, improving carrier injection efficiency, and avoiding the limitation of light extraction efficiency
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Embodiment 1
[0035] In this embodiment, metal aluminum is selected as the coupling metal, and the coupling enhances the luminous efficiency of the vertical structure ultraviolet LED.
[0036] Such as figure 1 As shown, the preparation method of the surface plasmon-enhanced crater-type 3D vertical structure LED structure provided by the present invention at least includes the following steps:
[0037] 1) On the epitaxial growth substrate, the LED epitaxial structure is grown by MOCVD. The emission wavelength of the multi-quantum well light-emitting layer 2 is 300nm.
[0038] 2) The P-type Mg-doped GaN layer 3 on the surface of the epitaxial wafer is exposed to ultraviolet light to produce a three-dimensional micro-nano quantum well light-emitting array on the photoresist, and then the photoresist is used as a mask, and the inductively coupled plasma The bulk dry etching method transfers the pattern to the P surface of the epitaxial wafer, etches through the multi-quantum well light-emitting...
Embodiment 2
[0046] In this embodiment, metallic silver is selected as the coupling metal, and the coupling enhances the luminous efficiency of the vertical blue LED.
[0047] Such as figure 1 As shown, the preparation method of the surface plasmon-enhanced crater-type 3D vertical structure LED structure provided by the present invention at least includes the following steps:
[0048] 1) On the epitaxial growth substrate, the LED epitaxial structure is grown by MOCVD. The emission wavelength of the multi-quantum well light-emitting layer 2 is 450nm.
[0049] 2) The P-type Mg-doped GaN layer 3 on the surface of the epitaxial wafer is imprinted with a three-dimensional micro-nano quantum well light-emitting array on the embossing glue by the method of nanoimprinting, and then the embossing glue is used as a mask, and the embossing glue is used as a mask. The pattern is transferred to the P surface of the epitaxial wafer by the etching method, the etching penetrates the multi-quantum well l...
Embodiment 3
[0057] In this embodiment, metallic silver is selected as the coupling metal, and nano particles are formed by annealing to enhance the luminous efficiency of the vertically structured green LED through coupling.
[0058] Such as figure 1 As shown, the preparation method of the surface plasmon-enhanced crater-type 3D vertical structure LED structure provided by the present invention at least includes the following steps:
[0059] 1) On the epitaxial growth substrate, the LED epitaxial structure is grown by MOCVD. The emission wavelength of the multi-quantum well light-emitting layer 2 is 550 nm.
[0060] 2) The P-type Mg-doped GaN layer 3 on the surface of the epitaxial wafer is exposed to electron beams to produce a three-dimensional micro-nano quantum well light-emitting array on the photoresist, and then the photoresist is used as a mask, and the laser ablation Method Transfer the pattern to the P surface of the epitaxial wafer, etch through the multi-quantum well light-e...
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Abstract
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