A kind of texturing method of monocrystalline silicon wafer
A single crystal silicon wafer, silicon wafer technology, applied in the direction of final product manufacturing, sustainable manufacturing/processing, climate sustainability, etc., can solve the problems of rework, high cost, poor suede appearance, etc., to save costs, improve The effect of productivity and appearance improvement
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[0016] The preferred embodiments of the present invention will be described in detail below with reference to the accompanying drawings, so that the advantages and features of the present invention can be more easily understood by those skilled in the art.
[0017] Reference attached figure 1 , a single crystal silicon wafer texturing method in this embodiment includes the following steps in sequence:
[0018] Rough polishing: remove the damaged layer and the dirt on the surface of the silicon wafer in the rough polishing tank. Add water and KOH solution to the rough throwing tank, the first addition amount of water is 218 ± 10L, then add 5000 ± 500mL in each round, the first addition amount of KOH solution is 5 ± 0.5L, and then add 250 ± 20mL per round, in the rough throw tank The temperature is 75±5℃, and the silicon wafer is soaked in the rough casting tank for 120±10s.
[0019] Pre-cleaning: Pre-cleaning is performed in the pre-cleaning tank. Add water, KOH solution and...
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