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A kind of texturing method of monocrystalline silicon wafer

A single crystal silicon wafer, silicon wafer technology, applied in the direction of final product manufacturing, sustainable manufacturing/processing, climate sustainability, etc., can solve the problems of rework, high cost, poor suede appearance, etc., to save costs, improve The effect of productivity and appearance improvement

Active Publication Date: 2020-05-05
HANWHA SOLARONE QIDONG
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  • Description
  • Claims
  • Application Information

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Problems solved by technology

The current single crystal texturing process has the following disadvantages: long process time and low production capacity; the use of new rapid texturing additives can increase production capacity, but the appearance of the suede surface is poor, and it is easy to cause a lot of rework
In order to ensure that there is no abnormality in the appearance of the silicon wafer after rapid texturing, the existing technology mainly adopts the method of increasing the liquid replenishment volume of the process tank and shortening the life of the process tank, which has the disadvantages of high cost and low production capacity.

Method used

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  • A kind of texturing method of monocrystalline silicon wafer

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Embodiment Construction

[0016] The preferred embodiments of the present invention will be described in detail below with reference to the accompanying drawings, so that the advantages and features of the present invention can be more easily understood by those skilled in the art.

[0017] Reference attached figure 1 , a single crystal silicon wafer texturing method in this embodiment includes the following steps in sequence:

[0018] Rough polishing: remove the damaged layer and the dirt on the surface of the silicon wafer in the rough polishing tank. Add water and KOH solution to the rough throwing tank, the first addition amount of water is 218 ± 10L, then add 5000 ± 500mL in each round, the first addition amount of KOH solution is 5 ± 0.5L, and then add 250 ± 20mL per round, in the rough throw tank The temperature is 75±5℃, and the silicon wafer is soaked in the rough casting tank for 120±10s.

[0019] Pre-cleaning: Pre-cleaning is performed in the pre-cleaning tank. Add water, KOH solution and...

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Abstract

The invention discloses a monocrystalline silicon piece texturing method. The method successively comprises the flowing steps that a damaged layer and dirt remaining on the surface of a silicon pieceare removed in a rough polishing groove; pre-washing is carried out in a pre-washing groove; first rinsing is carried out in a first rinsing groove; texturing is carried out in a texturing groove; second rinsing is carried out in a second rinsing groove; alkali wash is carried out in an alkali wash groove; third rinsing is carried out in a third rinsing groove; acid washing is carried out in an acid washing groove; fourth rinsing is carried out in a fourth rinsing groove; pre-dewatering is carried out in a slow pulling groove; drying is performed in a drying groove; normal temperature water is added in the first rinsing groove and the slow pulling groove, and the normal temperature water in the slow pulling groove is conveyed to the first rinsing groove through a pump. According to the monocrystalline silicon piece texturing method, the water temperature is changed during the slow pulling and first rinsing processes, hot water used in the prior art is replaced with normal temperaturecold water, the water in the slow pulling groove is constantly pumped into the first rinsing groove, so that the appearance of the silicon piece is improved after a quick texturing addition agent is used for texturing, meanwhile, the cost is reduced, and the productivity is improved.

Description

technical field [0001] The invention relates to a monocrystalline silicon wafer texturing method, which belongs to the technical field of solar cell preparation. Background technique [0002] With the rapid development of my country's photovoltaic industry, the market's requirements for batteries will become higher and higher in the future. High-efficiency batteries will become the protagonists, and enterprises that master the production technology of high-efficiency batteries will have the market initiative. This is why major photovoltaic companies have begun to Competing to deploy high-efficiency batteries. Under this circumstance, the monocrystalline battery market has a brighter prospect. But it needs to be clear that although the market opportunities for monocrystalline cells have emerged, the cost is still relatively high, and future development still requires technical support. The current single crystal texturing process has the following shortcomings: long process ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/18
CPCH01L31/1804Y02E10/547Y02P70/50
Inventor 刘俊稳赵福祥金起弘
Owner HANWHA SOLARONE QIDONG
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