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Semiconductor integrated circuit device

A technology of integrated circuits and semiconductors, applied in the manufacture of semiconductor devices, circuits, semiconductor/solid-state devices, etc., can solve problems such as increased power consumption, achieve the effects of improving yield, suppressing manufacturing deviation, and making manufacturing easy

Active Publication Date: 2022-07-29
SOCIONEXT INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in recent years, there has been a problem that excessive downsizing causes off-current, which in turn causes a significant increase in power consumption

Method used

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  • Semiconductor integrated circuit device
  • Semiconductor integrated circuit device
  • Semiconductor integrated circuit device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0034] Hereinafter, embodiments will be described with reference to the drawings. In the following embodiments, the semiconductor integrated circuit device includes a plurality of standard cells, and at least a part of the standard cells in the plurality of standard cells includes a nanowire FET (Field Effect Transistor).

[0035] Figure 14 It is a schematic diagram showing an example of a basic structure of a nanowire FET (also referred to as a gate-all-around (GAA) structure). Nanowire FETs are FETs using thin wires (nanowires) through which current flows. Nanowires are formed of, for example, silicon. like Figure 14As shown, the nanowires extend horizontally on the substrate, ie, parallel to the substrate, and are connected at both ends to structures that become the source and drain regions of the nanowire FET. In the specification of the present application, a structure that is connected to both ends of the nanowire and becomes the source region and the drain region ...

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PUM

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Abstract

Pads (21, 22, 23, 24, 25, 26) connected to nanowires (11, 12, 13, 14) in standard cell (1) comprising nanowire FETs (P11, P12, N11, N12) The nanowires (11, . . . ) are arranged in the X direction in which they extend with a prescribed center-to-center pitch (Pp). The cell width (Wcell) of the standard cell (1) is an integer multiple of the center-to-center pitch (Pp). In the case where the standard cells (1) are arranged to constitute the layout of the semiconductor integrated circuit device, the pads (21, . . . ) are regularly arranged in the X direction.

Description

technical field [0001] The present disclosure relates to a semiconductor integrated circuit device including a standard cell using a nanowire FET (Field Effect Transistor). Background technique [0002] It is known that there is a standard cell method as a method of forming a semiconductor integrated circuit on a semiconductor substrate. The standard cell method refers to a method in which basic cells with specific logic functions (such as inverters, latches, flip-flops, full adders, etc.) are prepared as standard cells in advance, and then a plurality of standard cells are arranged A way to design LSI chips by connecting these standard cells with wiring on a semiconductor substrate. [0003] A transistor that is a basic component of an LSI achieves an increase in integration, a decrease in operating voltage, and an increase in operating speed by reducing the gate length (scaling: scaling). However, in recent years, there has been a problem that excessive size reduction ca...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/82H01L21/822H01L21/8234H01L21/8238H01L27/04H01L27/088H01L27/092
CPCH01L27/092H01L21/823807H01L21/823871H01L27/0207H01L27/11807H01L29/42392H01L29/78696H01L29/0673H01L29/775B82Y10/00
Inventor 新保宏幸
Owner SOCIONEXT INC
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