Mask exposure offset detection method, mask exposure offset detection device, computer and storage medium

Abstract

The invention relates to a mask exposure offset detection method, a mask exposure offset detection device, a computer and a storage medium. The method comprises the following steps: acquiring first position parameters of two sides of a first register guide, and acquiring second position parameters of two second register guides corresponding to the first register guide, wherein the first register guide is located between the two second register guides; and calculating the offset according to the two first position parameters and the two second position parameters. The two first position parameters and the two second position parameters are obtained to calculate the offset, so the detection accuracy and the detection efficiency of the mask exposure offset are effectively improved.

Description

technical field [0001] The invention relates to the technical field of liquid crystal manufacturing, in particular to a mask plate exposure offset detection method, device, computer and storage medium. Background technique [0002] In recent years, with the vigorous development of liquid crystal devices, its production scale has become larger and larger; considering the impact of production capacity and cutting efficiency, the 8.5-generation production line can no longer meet the needs of the market, so the 10.5-generation or 11-generation production lines came into being , and with the introduction of the 5G network era, domestic LCD panel manufacturers began to propose the "8425" strategy, in which LCD panels are still the mainstream. [0003] The substrate size of the traditional 8.5-generation production line has reached 2200mm*2500mm, and with the upgrading of the production line, the size of the substrate has increased, and has grown to about 3000mm. Large-sized substr...

AI Technical Summary

Problems solved by technology

The two substrates that make up the LCD screen: ColorFilter (color filter) substrate and Array (array) basically require multiple photolithography processes. Due to the large size of the substrate, one photolithography process requires multiple exposures, so the first The first lithography process is more important. It must first determine the basic outline. The subsequent lithography is based on this basic framework to carry out the alignment lithography process. The first lithography process needs to determine the outline of the graphics to be processed, which often requires Measuring the graphic offset of different exposures is called the graphic Shot offset in the industry. According to this offset, the results of multiple exposures are judged to be good or bad. Therefore, special testing equipment is required to detect this offset. Traditional detection The method is to measure the shape accuracy and relative position accuracy of each exposure shot, but the detection speed of the traditional detection method is slow, which affects the detection efficiency and directly affects the production efficiency

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