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Auxiliary carrier for cleaning photomask and photomask cleaning machine

A technology of photolithography plate and cleaning machine, which is applied in the direction of photolithography plate-making process of originals, optics, and pattern surface for photomechanical processing, and can solve the problems of photolithography plate damage, carrier shaking, and separation from the carrier, etc. achieve a good fixation effect

Active Publication Date: 2018-11-09
HC SEMITEK SUZHOU
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Since the shape surrounded by the fixed stopper on the stage is fixed, it cannot be applied to photoresist plates with different perimeters and shapes. If the photoresist plate with a different shape from the fixed stopper is forcibly cleaned, it will cause Shaking in the stage or even breaking away from the stage will cause damage to the photolithography plate

Method used

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  • Auxiliary carrier for cleaning photomask and photomask cleaning machine
  • Auxiliary carrier for cleaning photomask and photomask cleaning machine
  • Auxiliary carrier for cleaning photomask and photomask cleaning machine

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Embodiment Construction

[0026] In order to make the object, technical solution and advantages of the present invention clearer, the implementation manner of the present invention will be further described in detail below in conjunction with the accompanying drawings.

[0027] figure 1 It is a structural schematic diagram of a carrier platform of a washing machine provided by an embodiment of the present invention, figure 2 yes figure 1 side view. The auxiliary carrier in the embodiment of the present invention can be applied to figure 1 and figure 2 In order to facilitate the understanding of the present invention, the structure of the carrier of the cleaning machine applied to the auxiliary carrier in the embodiment of the present invention will be briefly described below.

[0028] combine figure 1 and figure 2 The carrier 1 of the washing machine can include a rotating shaft 11, a plurality of support rods 12 and a plurality of blocks 13, the rotating shaft 11 is arranged in a vertical dir...

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Abstract

Belonging to the photomask processing field, the invention discloses an auxiliary carrier for cleaning a photomask and a photomask cleaning machine. The auxiliary carrier is designed to include a carrier plate and at least two pressure blocks. The carrier plate is provided with an installation groove, and the photomask is placed parallel in the installation groove parallelly. When the cleaning machine cleans the photomask, the auxiliary carrier fixedly disposed on the cleaning machine rotates along with a carrying platform. the rotating shafts of the at least two pressure blocks are both located at the middle part of the pressure blocks and divide the pressure blocks into first parts and second parts, the first parts and second parts respectively extend to places above and below the installation groove, and the centers of gravity are disposed at the second parts, in the rotation process of the auxiliary carrier, the pressure blocks can compress the photomask to the carrier plate for fixation conveniently, so that the photomask cannot break away from the carrying platform and be damaged.

Description

technical field [0001] The invention relates to the field of photolithographic plate processing, in particular to an auxiliary carrier for cleaning the photolithographic plate and a photolithographic plate cleaning machine. Background technique [0002] The photolithography plate is widely used in the processing and production of light-emitting diode epitaxial wafers. It has a certain pattern structure, which can be transferred to the chip through exposure, development and etching operations to form characteristic patterns on the chip. After the photoresist plate is used for a period of time, its surface will be stained with dirt, so the photoresist plate needs to be cleaned regularly to ensure its normal use. [0003] The existing photoresist plates are usually cleaned by a cleaning machine. The cleaning machine includes a carrier and a cleaning brush. The table rotates around the vertical line of the photoresist plate, and at the same time, the cleaning machine controls t...

Claims

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Application Information

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IPC IPC(8): G03F1/82
CPCG03F1/82
Inventor 黄杰
Owner HC SEMITEK SUZHOU
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