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Purification device and exposure machine

A technology of purification device and purifier, which is applied in the field of exposure machines, can solve the problems of substrate exposure illuminance and exposure uniformity, pollution, etc., and achieve the effects of avoiding production loss, reducing pollution, and eliminating cleaning or replacement

Inactive Publication Date: 2018-11-16
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide a purification device and an exposure machine to solve the technical problem that the exposure illuminance and exposure uniformity of the substrate are affected by the pollution of impurities to the unit mirror group of the light source unit

Method used

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  • Purification device and exposure machine
  • Purification device and exposure machine

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Embodiment Construction

[0020] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

[0021] The cleaning device of the present invention can be applied to an exposure machine. Exposure machines include such as figure 2 The purification device shown, the purification device includes a first pipeline 110, a first purifier 20 and a circulation unit 30 connected to the first purifier 20, and the light source part 10 is connected to the first pipeline 110 through the first pipeline 110. The first purifier 20 is connected.

[0022] Wherein, the gas en...

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Abstract

The invention provides a purification device which is used for purifying a light source portion in an exposure machine and comprises a first pipeline, a first purifier and a circulation unit connectedwith the first purifier; and the light source portion is connected with the first purifier through a first pipeline, wherein gas entering the light source portion enters the first pipeline after bringing out impurities in the light source portion, the first purifier performs purification treatment on the gas output from the first pipeline and outputs the gas after purification treatment to the circulation unit, and the gas in the circulation unit is exhausted when the concentration of the impurities in the gas in the circulation unit is larger than a threshold concentration. The purificationdevice solves the technical problem that the exposure illumination and the exposure uniformity of a substrate are influenced by pollution of the impurities to a unit mirror group of the light source portion.

Description

technical field [0001] The invention relates to the field of exposure machines, in particular to a purification device and an exposure machine with the purification device. Background technique [0002] In the LCD (Liquid Crystal Display, Liquid Crystal Display) manufacturing process, the exposure machine is a key device for preparing fine pixel patterns on the substrate. In the light source structure of the existing exposure machine, a miniaturized mercury lamp MLH (Multi LampHouse) is used. However, during the exposure production process of such small mercury lamps, impurities such as mercury vapor will be generated, which will inevitably pollute the unit mirror group of the light source, resulting in atomization of the mirror group, and the exposure illuminance and exposure uniformity of the substrate will be affected. influences. [0003] The optical path structure diagram of the current exposure machine is as follows: figure 1 As shown, it includes a light-emitting u...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20B01D53/00B01D53/64B01D46/00
CPCB01D46/00B01D46/0027B01D53/00B01D53/64B01D2257/602G03F7/70933
Inventor 罗祝义林晓丹何鹏达刘志强王洪涛
Owner SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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