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Rotary nozzle structure dust collection system

A technology of dust collection system and rotating nozzle, which is applied in the direction of dust removal, cleaning methods and utensils, chemical instruments and methods, etc., which can solve the problems of undisclosed, dust or foreign matter size limitation, dust or foreign matter not being removed, etc., to prevent Effect of substrate damage

Active Publication Date: 2022-03-25
NTK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Known prior art, the application of which is limited by the size of the dust or foreign matter generated by the substrate, and there may be areas where the dust or foreign matter is not removed during application
Therefore, there is a need for a dust collecting device that can remove foreign objects of any size that may affect the performance of the substrate itself or the production process of the substrate, have a uniform dust removal effect on the entire substrate, and avoid damage to the substrate during the dust removal process, but The prior art does not disclose such a device

Method used

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  • Rotary nozzle structure dust collection system
  • Rotary nozzle structure dust collection system
  • Rotary nozzle structure dust collection system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] figure 1 An embodiment of the rotary nozzle configuration of the present invention is shown.

[0023] Such as figure 1 As shown, the rotary nozzle configuration dust collecting system 10 includes a housing 11, an internal arrangement of a path for collecting foreign matter, and a chamber space is provided; the nozzle units 13a to 13n are arranged along one side of the housing 11; supply The valve 12 is used to supply compressed air to the nozzles 13a to 13n; guide plates 16a, 16b, in the horizontal direction of both sides of the casing 11; and dust collecting inlets 14a, 14b, provided in the cover 11 and guide The boundary surfaces of the boards 16a, 16b, each of the respective nozzles 13a to 13n are provided with a pair of mouths separated from each other and rotatable.

[0024] The rotating nozzle configuration dust collecting system 10 of the present invention is disposed on the upper side of the substrate transferred by the transfer device, but is not limited thereto, ...

Embodiment 2

[0032] figure 2 An auxiliary device embodiment for improving performance is shown in the rotary nozzle configuration dust system of the present invention.

[0033] figure 2 Side schematic diagram of the rotating nozzle construction dust system, such as figure 2 As shown, the nozzle unit is fixed to the nozzle frame 18 provided on the lower side of the casing 11. Further, at least one ion generator 17a, 17b may be provided between the nozzles 13a to 13n and the dust collecting ports 14a, 14b.

[0034] The ion generators 17a, 17b are fixed to the casing 11 by a fixed axis, which is electrostatically electrostatically electricity to the substrate surface, and the ion generators 17a, 17b have the effect of removing this static electricity. The ion generators 17a, 17b can be injected with air including negative ions or positive ions, and prevent damage to the substrate from being damaged and the continental formation of foreign matter. The ultrasonic unit can also be provided while s...

Embodiment 3

[0038] image 3 An embodiment of a nozzle unit in a rotating nozzle construct a dust collecting system of the present invention is shown.

[0039] Such as image 3 As shown, the nozzle unit 13a includes a rotating supply member 31 that extends the position adjustment member 32 disposed on both sides of the rotation supply member 31 and a nozzle 33a, 33b disposed on both sides of the position adjustment member 32, and the position adjustment member 32. The inclined plane 321 is provided on both sides, and the nozzles 33a, 33b are disposed on the inclined plane 321.

[0040] The rotation supply member 31 and the position adjustment member 32 are cylindrical, the position adjustment member 32 diameter is smaller than the rotary supply member 31, which is connected to the rotating supply member 31, and the nozzle unit 13a is tit in T-shaped. On both sides of the position adjustment member 32, a conical nozzle 33a, 33b can be injected into a fluid for the substrate dust removal to the p...

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PUM

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Abstract

The present invention relates to an electrical dust collection system, and more particularly to a dust collection system with a rotating nozzle structure that sprays fluid such as air from a plurality of rotating nozzles onto the surface of an electronic substrate, glass substrate, wafer, or display to remove foreign matter on the surface. The rotating nozzle structure dust collection system includes: a casing (11), which is provided with a path for collecting foreign matter inside, and a chamber space; a nozzle unit (13a-13n), along a side of the casing (11), The side linear arrangement; the supply valve (12) is used to supply compressed air to the nozzle unit (13a-13n); the guide plate (16a, 16b) is arranged along the horizontal direction on both sides of the casing (11); and the set The dust inlets (14a, 14b) are arranged on the boundary surfaces of the casing (11) and the guide plates (16a, 16b); each nozzle unit (13a-13n) is provided with a pair of nozzles spaced apart from each other and rotatable.

Description

Technical field [0001] The present invention relates to an electrical dust collecting system, and more particularly to a rotary nozzle to remove a rotary nozzle such as a surface foreign matter such a fluid such as an electrical dust collecting system to remove air or the like from a plurality of rotating nozzles, a glass substrate, a wafer or a display or the like. Background technique [0002] A variety of dust removal devices for removing various forms of various forms produced by various substrate surfaces in the industrial field have a removal efficiency of the dust removal device depending on the size of the removal of dust and whether damage to the substrate can be prevented. The dust generated by the semiconductor wafer, the liquid crystal display substrate or the glass substrate production process is removed from a dry or wet dust removal device, and this dust can be removed by a dust removal device having a brush or nozzle structure. [0003] South Korea authorized pate...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B08B15/00B08B15/02B08B11/00
CPCB08B11/00B08B15/00B08B15/02
Inventor 黄昌培
Owner NTK