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cleaning equipment

A technology of cleaning equipment and water washing unit, which is applied in the field of cleaning, and can solve problems such as poor cleaning effect, achieve the effect of ensuring cleaning effect and solving poor cleaning effect

Active Publication Date: 2021-11-02
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The invention provides a cleaning device to solve the technical problem of poor cleaning effect caused by the precipitation of organic matter in the water washing unit in the prior art

Method used

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Embodiment Construction

[0033] The following descriptions of the various embodiments refer to the accompanying drawings to illustrate specific embodiments in which the invention may be practiced. The directional terms mentioned in the present invention, such as [top], [bottom], [front], [back], [left], [right], [inside], [outside], [side], etc., are only for reference The orientation of the attached schema. Therefore, the directional terms used are used to illustrate and understand the present invention, but not to limit the present invention. In the figures, structurally similar elements are denoted by the same reference numerals.

[0034] Aiming at the technical problem of poor cleaning effect caused by the precipitation of organic matter in the water washing unit in the prior art, such as figure 1 As shown, the present invention can solve this defect by transporting the oxidative oxidizing gas generated by the ultraviolet irradiation unit, mainly ozone (O3), to the water washing unit to oxidize ...

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Abstract

The present invention provides a cleaning device, which includes a cleaning unit. When the cleaning device is working, the cleaning unit transmits the oxidative gas generated by the ultraviolet irradiation unit to the water washing unit, and oxidizes the organic matter precipitated in the water washing unit; thus, when the cleaning device is working It can oxidize the organic matter precipitated in the washing unit. After the organic matter is oxidized, it will not cause mycelium growth, which ensures the cleaning effect of the cleaning equipment, and also avoids the oxidative gas generated by the ultraviolet irradiation unit from being directly discharged into the cleaning equipment. There is no need to separately clean the organic matter precipitated in the water washing unit, which solves the technical problem of poor cleaning effect caused by the precipitation of organic matter in the water washing unit existing in the prior art.

Description

technical field [0001] The invention relates to the cleaning field, in particular to a cleaning device. Background technique [0002] In industries such as flat panel display, the array process mainly includes film formation, photolithography and etching; film formation is to deposit metal and other materials on the glass substrate to form a film layer of a certain thickness; photolithography is to convert the pattern on the mask Printed on the film layer of the glass substrate, the pattern is composed of photoresist; finally, the etching process etches away the uncovered part of the photoresist pattern, and then passes through the photoresist stripping unit to leave the corresponding photoresist pattern. [0003] Among them, the yellow light process includes cleaning, dehydration and drying, coating, pre-baking, exposure, development and post-baking processes. The cleaning equipment corresponding to the cleaning process includes: EUV (ultraviolet) irradiation unit, Brush (...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C02F1/32B08B3/04C02F1/72
CPCB08B3/04C02F1/32C02F1/72
Inventor 潘国宇
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD