Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

A lunar surface safe landing area selection method and system

A technology for safe landing and landing zone, applied in image analysis, image enhancement, instruments, etc., can solve the problems of no lunar surface terrain factor safety evaluation threshold, no verification of slope correctness, low resolution of DEM data, etc.

Active Publication Date: 2019-04-09
SHANDONG UNIV
View PDF12 Cites 11 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the accuracy of DEM data on the lunar surface is low (ten-meter level), and there are a large number of meter-level or even decimeter-level negative terrain (craters, grooves) and positive terrain (ridges, steep slopes, and rocks) on the surface of the lunar landing area. etc.) objects, which are potential threats to lander landing and rover path planning
The low resolution of DEM data makes it difficult to conduct a comprehensive and detailed study of the morphology and meter-level threats of the pre-selected landing area
[0006] (2) In the prior art, there is no systematic and accurate description of the safety evaluation threshold of the lunar surface terrain factors, and it is difficult to comprehensively evaluate and select the safety of the lunar surface landing area quantitatively
Taking the slope as an example, there is no evaluation method for describing the safety slope threshold of the landing area, nor is it verified that the slope is within the threshold area and is suitable for landing

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A lunar surface safe landing area selection method and system
  • A lunar surface safe landing area selection method and system
  • A lunar surface safe landing area selection method and system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0042] It should be pointed out that the following detailed description is exemplary and intended to provide further explanation to the present application. Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs.

[0043] It should be noted that the terminology used here is only for describing specific implementations, and is not intended to limit the exemplary implementations according to the present application. As used herein, unless the context clearly dictates otherwise, the singular is intended to include the plural, and it should also be understood that when the terms "comprising" and / or "comprising" are used in this specification, they mean There are features, steps, operations, means, components and / or combinations thereof.

[0044] The purpose of the implementation example of the present disclosure is to identify the positive and negat...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a lunar surface safe landing area selection method and system, and the method comprises the steps: carrying out the recognition of the positive and negative microtopographies of the lunar surface through employing a dual-threshold image segmentation method for the high-resolution remote sensing image data in a grid format; Calculating the percentage of a flat area of each grid in the pre-selected landing area, and generating a percentage grid image of the flat area of the pre-selected landing area; Counting the average percentage value of the flat area of the landing area of the lunar landing task to serve as an evaluation threshold value of the lunar landing area safety; And comparing the calculated percentage of the flat area of each grid in the pre-selected landing area with an evaluation threshold value, and generating a grid image of the safety evaluation result of the pre-selected landing area when the percentage is smaller than the evaluation threshold value, namely the unsafe grid and larger than or equal to the evaluation threshold value, namely the safety grid. A landing area is divided into safe and unsafe grids, and accurate selection of the safelanding area is achieved.

Description

technical field [0001] The present disclosure relates to the technical field of planetary remote sensing digital image processing and planetary surface digital terrain analysis, in particular to a method and system for selecting a safe landing area on the lunar surface. Background technique [0002] As the natural satellite of the earth, the moon is the first choice for human deep space exploration. The exploration and research of the moon is of great strategic significance to my country's technological, economic and social development. [0003] From the 1960s to the present, countries such as the United States and the former Soviet Union have successively launched multiple series of lunar landing probes. Limited by engineering technology and scientific level, early lunar landing probes (such as Luna and Surveyor series) did not have the ability to identify obstacles and select a safe landing area, so their landing success rate was very low. In the later stage of the Apollo...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G06K9/00G06K9/34G06K9/62G06T7/136
CPCG06T7/136G06T2207/10032G06V20/13G06V10/26G06F18/24
Inventor 李勃姚佩雯张江凌宗成付晓辉倪宇恒
Owner SHANDONG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com