Etching monitoring device and etching monitoring method

Abstract

The invention provides an etching monitoring device and an etching monitoring method. The etching monitoring device includes a plurality of monitoring units. Each of the monitoring units includes an incident light source and a signal processing module corresponding to the incident light source. Each incident light source is disposed corresponding to an etched region on the substrate to be etched.Different incident light sources correspond to different etched regions. The incident light sources are used for emitting incident light to the corresponding etched regions. The signal processing module is used for receiving reflected light, and converting the reflected light into a corresponding electrical signal according to the intensity of the reflected light. The etching stats of the substrate to be etched are determined by monitoring the change of the obtained electrical signal through the conversion of each signal processing module; the etching process can be effectively monitored; accurate data is provided for etching quality analysis; and development of etching processes and improvement of etching precision are promoted.

Description

technical field [0001] The invention relates to the field of display technology, in particular to an etching monitoring device and an etching monitoring method. Background technique [0002] With the development of display technology, liquid crystal displays (Liquid Crystal Display, LCD) and other flat display devices are widely used in mobile phones, televisions, personal Various consumer electronic products such as digital assistants, digital cameras, notebook computers, and desktop computers have become the mainstream of display devices. [0003] Most of the liquid crystal display devices currently on the market are backlight liquid crystal displays, which include a liquid crystal display panel and a backlight module. The working principle of the liquid crystal display panel is to place liquid crystal molecules between two parallel glass substrates. There are many vertical and horizontal small wires between the two glass substrates. The direction of the liquid crystal mo...

AI Technical Summary

Problems solved by technology

[0005] The etching process is often used in the production process of liquid crystal display panels, and the accuracy of the determination of the etching end point has a great influence on the effect of the etching process. The size of the processed substrate is 2*2m 2 As mentioned above, when etching the metal film on the surface of such a huge substrate, the etching accuracy is required to reach 0.05 microns and higher, and at the same time, the etching process is required to be able to complete the uniform etching of large-size panels. Lack of effective monitoring means to effectively monitor the etching quality

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