Infrared focal plane array
An infrared focal plane and array technology, applied in the field of infrared focal plane arrays, can solve problems such as different power supply voltages and uneven images of focal plane arrays
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment
[0043] Hereinafter, the present invention will be further described by taking an infrared focal plane array of HgCdTe material (the material of the epitaxial wafer) with 800×600 pixels and a pixel distance of 15 μm as an example.
[0044] In the traditional process, the current of each pixel is input by the common electrode located at the edge of the array, and then transmitted to the pixel through the HgCdTe epitaxial wafer semiconductor material. Usually, the thickness of the epitaxial wafer material is 10-20 μm, and the resistance from the edge of the infrared focal plane array to the center of the focal plane array is more than hundreds of ohms. The working voltage should be lower than 0.12V. Since the pixel has a pn junction structure electrically, the working status of the pixel is different under different operating voltages. This results in that all the picture elements in the array are not in the same working state, and finally the electrical uniformity of the entire...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 


