Large-thermal-field automatic loading device and method

Abstract

The invention discloses a large-thermal-field automatic loading device. The large-thermal-field automatic loading device at least comprises a feeding system, a discharging system and an electric control system, wherein the feeding system comprises a feeding table for containing a material basket and a material turning assembly used for turning the feeding table, and the discharging system comprises a collecting hopper and a discharging opening. The invention further discloses a large-thermal-field automatic loading method. The large-thermal-field automatic loading method comprises the following steps that the material basket is conveyed to the feeding table; the feeding table is lifted by a feeding lifting system; a silicon material is poured into the collecting hopper by the material turning assembly; and the silicon material entering the collecting hopper is screened by a vibration screening system and then is fed into a hopper or a crucible through the discharging opening. Accordingto the large-thermal-field automatic loading device and method, the problems of low efficiency and long time consumption of manual feeding in the existing single crystal preparation industry are solved, the silicon material is poured into the collecting hopper by the automatic feeding system, and then undergoes screening to be put into the hopper or the crucible through the discharging opening, the whole feeding process is realized by a machine, an operator is only responsible for operation after the silicon material is conveyed to the feeding table, so that the feeding efficiency is improved, and the enterprise cost and the risk of occupational diseases of workers are reduced.

Description

technical field [0001] The invention belongs to the technical field of single crystal smelting, specifically relates to a large thermal field automatic charging device, and also relates to an automatic charging method using the device. Background technique [0002] At present, in the process of crystal pulling by Czochralski method, multiple silicon rods will be pulled out from each furnace, so it will be accompanied by multiple charging. The existing charging method is: the first drawn silicon rod is charged in a crucible , after melting the material, use barrel feeding several times to make up the feeding amount; each subsequent feeding is made by barrel feeding, and the number of feeding times per furnace reaches dozens of times. However, the existing feeding methods, whether crucible feeding or barrel feeding, all use manual feeding, which is inefficient, time-consuming, and labor-intensive, and the inhalation of silicon dust during long-term work may cause occupational ...

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to provide a large thermal field automatic charging device, which solves the problems of low efficiency and long time consumption in the existing single crystal preparation industry.

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