Light emitting diode chip and preparation method thereof
A light-emitting diode and chip technology, which is applied in the direction of electrical components, circuits, semiconductor devices, etc., can solve the problems of limited luminous efficiency and low luminous efficiency, and achieve the effect of improving luminous efficiency and luminous angle
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Embodiment 1
[0074] Embodiment 1 of the present application provides a light emitting diode chip, such as figure 1 As shown, it includes: a permanent substrate 10, a P-type electrode layer 11 located under the permanent substrate 10, a bonding layer 12, a specular reflection layer 13, a P-type layer 14, and an active layer 15 located on the permanent substrate 10 in sequence , N-type layer 16 and N-type electrode layer 17.
[0075] The N-type layer 16 includes an ohmic contact layer 161 in contact with the N-type electrode layer 17 and an N-type roughened layer 162. The N-type roughened layer 162 includes a first contact layer 1621 in contact with the ohmic contact layer 161 and the N-type electrode layer 17 And the first roughened layer 1622 located under the ohmic contact layer and exposed outside the N-type electrode layer 17.
[0076] The contact between the P-type layer 14 and the specular reflection layer 13 includes a second roughened layer 141 located under the N-type electrode layer 17...
Embodiment 2
[0100] Example 2 of the present application provides a method for preparing a light-emitting diode chip, which is used to prepare the light-emitting diode as in Example 1, such as Figure 4 As shown, it specifically includes the following steps S401 to S40:
[0101] S401, forming an etching stop layer, an N-type layer, an active layer, and a P-type layer in sequence on a temporary substrate, where the N-type layer includes an ohmic contact layer and an N-type roughened layer.
[0102] S402, etching a second roughened layer in a predetermined area on the P-type layer, so that the P-type layer forms a second roughened layer with a set cross-sectional area and a non-roughened layer located outside the second roughened layer.
[0103] S403, forming a specular reflection layer matching the roughening layer on the P-type layer on which the second roughening layer is etched, and forming a bonding layer on the specular reflection layer.
[0104] S404, bonding the bonding layer to the permanent...
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