Grating displacement sensor based on second diffraction light interference

A technology of grating displacement and second diffraction, applied in instruments, optical devices, measuring devices, etc., can solve the problems of small installation tolerance, limited effective subdivision multiples, limited use accuracy, etc., to improve measurement accuracy, avoid light Loss, the effect of high application efficiency

Active Publication Date: 2019-06-21
XI AN JIAOTONG UNIV
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Problems solved by technology

At present, electronic subdivision is an effective way to improve measurement resolution, but problems such as grating signal quality introduce nonlinear subdivision errors, which limits the effective subdivision multiple. One of the important technical means of high-precision grating displacement sensor; at the same time, the problem of small installation tolerance has become an important factor limiting the actual use accuracy of grating sensor, reducing the requirements of assembly tolerance and alignment tolerance of the system, and improving the stability of the system It is an essential part of the design of high-precision grating displacement sensor

Method used

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  • Grating displacement sensor based on second diffraction light interference
  • Grating displacement sensor based on second diffraction light interference
  • Grating displacement sensor based on second diffraction light interference

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Embodiment Construction

[0026] The present invention will be described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0027] In describing the present invention, it should be understood that the terms "center", "longitudinal", "transverse", "upper", "lower", "front", "rear", "left", "right", " The orientations or positional relationships indicated by "vertical", "horizontal", "top", "bottom", "inner" and "outer" are based on the orientations or positional relationships shown in the drawings, and are only for the convenience of describing the present invention and Simplified descriptions, rather than indicating or implying that the device or element referred to must have a particular orientation, be constructed and operate in a particular orientation, and thus should not be construed as limiting the invention. In addition, the terms "first" and "second" are used for descriptive purposes only, and cannot be interpreted as indicating or implying relative import...

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Abstract

The present invention discloses a grating displacement sensor based on second diffraction light interference. The sensor comprises a laser, a grating, a polarizing beam splitter, a quarter-wave plate,a backward reflector, a beam splitter, a photoelectric detector and an optical fiber. The method of second diffraction polarized light interference is employ to improve the resolution ratio of the system twice and improve the measurement precision; and an optical structure with symmetrical common paths is employed so that the optical path difference of two coherent lights is zero and the influence of an external environment on the system is reduced; and moreover the polarization optics features are utilized to improve the light application efficiency and improve the system reliability. The grating displacement sensor based on second diffraction light interference has important values for improvement of the measurement resolving power and the actual use precision of the grating displacement sensor.

Description

technical field [0001] The invention belongs to the technical field of precision displacement sensors, and in particular relates to a grating displacement sensor based on secondary diffraction light interference. Background technique [0002] Due to the development of precision and high-precision manufacturing technology, the size of core parts of high-end CNC machine tools and basic equipment, precision and intelligent instruments and test equipment has been constantly broken through, and the requirements for measurement accuracy have also increased. The traditional laser interferometry system uses the wavelength of light as the measurement basis, and the measurement accuracy is easily disturbed by the external environment. low and therefore more preferred. Since the German Heidenhain company developed the interferometric grating ruler for nanoscale measurement in 1987, a group of international manufacturers and research institutions including Sony and Canon have carried o...

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Application Information

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IPC IPC(8): G01B11/02
Inventor 叶国永刘辉刘红忠李烜雷彪赵国博李映江
Owner XI AN JIAOTONG UNIV
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