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Manufacturing method of color optical filter

A technology of color filter and manufacturing method, which is applied in semiconductor/solid-state device manufacturing, electrical components, electric solid-state devices, etc., and can solve problems such as low yield rate and high cost

Active Publication Date: 2019-06-21
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] In view of this, the present invention provides a method for manufacturing a color filter to solve the problems of high cost and low yield of using a three-tone mask to form a black photosensitive gap material layer in the prior art

Method used

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  • Manufacturing method of color optical filter
  • Manufacturing method of color optical filter
  • Manufacturing method of color optical filter

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Embodiment Construction

[0027] The following descriptions of the various embodiments refer to the accompanying drawings to illustrate specific embodiments in which the present invention can be practiced. Furthermore, the directional terms mentioned in the present invention are, for example, up, down, top, bottom, front, back, left, right, inside, outside, side, surrounding, central, horizontal, transverse, vertical, longitudinal, axial, The radial direction, the uppermost layer or the lowermost layer, etc. are only directions referring to the attached drawings. Therefore, the directional terms used are used to illustrate and understand the present invention, but not to limit the present invention.

[0028] Please refer to figure 1 As shown, the manufacturing method 10 of a color filter according to an embodiment of the present invention includes steps 11 to 15: providing a substrate (step 11); forming a patterned sacrificial layer on the substrate, wherein the patterned sacrificial layer Including...

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Abstract

The invention discloses a manufacturing method of a color optical filter. The manufacturing method of the color optical filter comprises the following steps: forming a patterned sacrifice layer with thickness difference on a substrate, thereby enabling a patterned black photosensitive clearance material layer to be formed through a monotone photomask or a halftone photomask, wherein the patternedblack photosensitive clearance material layer has the effects of the original black matrix, main interstitial and secondary interstitial. The manufacturing cost can be reduced, and the yield is high.

Description

technical field [0001] The present invention relates to a manufacturing method of a display component, in particular to a manufacturing method of a color filter. Background technique [0002] Compared with Liquid Crystal Display (LCD), organic light emitting diode display (Organic light emitting diode Device) has the advantages of self-illumination, fast response, wide viewing angle, high brightness, bright color, light and thin, etc. It is considered to be the next generation display technology. [0003] Please refer to Figure 7 , which is a schematic cross-sectional view of a conventional color filter 70 . For the color filter 70 used in an OLED display, generally speaking, a black matrix 72 is usually formed between a plurality of pixels 71 (or a plurality of sub-pixels 711 ). After that, a transparent conductive layer 73 is formed on the pixel 71 (or the plurality of sub-pixels 711) and the black matrix 72, and main spacers with different heights (or thicknesses) are f...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L27/32H01L51/52H01L51/56
CPCH10K71/00H10K59/80
Inventor 宋江江
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD