A kind of graphene electromagnetic shielding film and preparation method thereof
An electromagnetic shielding film, graphene technology, applied in the fields of magnetic field/electric field shielding, electrical components, etc., can solve the problems of difficult to achieve, inability to use non-conductive substrates, and high production costs
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Embodiment 1-PI
[0093] The preparation of embodiment 1-PI graphene electromagnetic shielding film
[0094] According to the method provided by the present invention, the PI supporting substrate is cleaned with a strong alkali solution of pH 12~14 to remove dust and oil stains, etc., wherein the thickness of the PI supporting substrate is 50 microns; After being coated on the PI support substrate, it was dried at 120°C for 30 minutes to prepare a composite film, wherein the graphene conductive ink includes DMF, Thermoplastic acrylic resin, graphene, carbon nanotubes, anti-hydrolysis agent; anneal the dried composite film at 300°C for 10 minutes, after annealing, clean the surface of the composite film with deionized water, put into alkaline copper plating Electroplating is carried out in a solution (the present embodiment is a copper chloride system) to form a first conductive layer on the annealed composite film, wherein the electroplating temperature is 30-40° C., and the area ratio of the c...
Embodiment 2
[0096] The preparation of embodiment 2-PET graphene electromagnetic shielding film
[0097] According to the method provided by the present invention, the PET support substrate is cleaned with a strong alkali solution of pH 12~14 to remove dust and oil stains, etc., wherein the thickness of the PET support substrate is 50 microns; After being coated on the PET support substrate, it is dried at 100°C for 15 minutes to prepare a composite film, wherein the graphene conductive ink includes DMF and oily polyurethane resin with a component mass ratio of 1:0.14:0.056:0.014 , graphene, acetylene black; the described composite film is annealed with 200 ℃ for 20 minutes through drying, after annealing, carry out roll pressing, clean this composite film surface with deionized water, put into acidic copper plating solution (this embodiment is copper sulfate system) to form a first conductive layer on the annealed composite film, wherein the electroplating temperature is 30-40°C, the area...
Embodiment 3-A
[0100] The preparation of embodiment 3-ABS graphene electromagnetic shielding film
[0101] According to the method provided by the present invention, the ABS support substrate is cleaned with a strong alkali solution of pH 12~14 to remove dust and oil stains, etc., wherein the thickness of the ABS support substrate is 50 microns; the graphene conductive ink is sprayed by spraying After being placed on the ABS support base, it was dried at 80°C for 50 minutes to prepare a composite film, wherein the graphene conductive ink comprises DMF, thermoplastic acrylic resin, thermoplastic acrylic resin, Graphene, acetylene black, anti-hydrolysis agent; The described composite film is annealed with 160 ℃ for 10 minutes with 160 ℃ of drying, after annealing, carry out hot pressing, clean this composite film surface with deionized water, put into acidic nickel plating solution (this An embodiment is electroplating in a nickel chloride and nickel sulfate system) to form a first conductive ...
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Abstract
Description
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