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Polishing composition, method for producing the same, and method for magnetic polishing

A technology for manufacturing methods and compositions, applied in the direction of chemical instruments and methods, other chemical processes, etc., capable of solving problems such as sufficient effects

Active Publication Date: 2022-07-15
FUJIMI INCORPORATED
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, although the polishing composition disclosed in Patent Document 3 can suppress surface defects such as scratches on the object to be polished made of a soft metal material, it cannot be said that its effect is sufficient.

Method used

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  • Polishing composition, method for producing the same, and method for magnetic polishing
  • Polishing composition, method for producing the same, and method for magnetic polishing
  • Polishing composition, method for producing the same, and method for magnetic polishing

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0138] After mixing magnetic particles, non-magnetic abrasive particles (hereinafter referred to as "abrasive particles"), anticorrosion agent, additives, and water, an appropriate amount of nitric acid or potassium hydroxide was added to adjust the pH to a predetermined value to obtain Example 1 abrasive composition. As shown in Table 1, the type of magnetic particles is Fe with a saturation magnetization of 78.5 emu / g 3 O 4 (magnetite), the shape of the magnetic particles was octahedral, and the average primary particle size (50% particle size D50 in the cumulative particle size distribution based on volume) was 0.17 μm. In addition, the content of the magnetic particles in the polishing composition was 50.0% by mass.

[0139] The type of abrasive grains was colloidal silica, and the average primary particle diameter was 35 nm and the average secondary particle diameter was 65 nm. In addition, the content of the abrasive grains in the polishing composition was 5.0% by mas...

Embodiment 2~25 and comparative example 1~11

[0159] Except that at least one of the type, saturation magnetization, shape, and 50% particle diameter D50 of the magnetic particles was different (see Tables 1 and 2), the polishing compositions were prepared and prepared in the same manner as in Example 1. Magnetic grinding.

[0160] In addition, the magnetic particles used in the polishing compositions of Comparative Examples 7 to 11 were magnetite, and the polishing compositions were prepared by mixing commercial products of magnetite-containing magnetic fluids. The magnetic fluid used in the polishing composition of Comparative Example 7 was magnetic fluid ferricoloid 1003S manufactured by Taiho Industries Co., Ltd. Similarly, Comparative Example 8 is magnetic fluid HC-50 manufactured by Taiho Industries Co., Ltd., Comparative Example 9 is magnetic fluid W40 manufactured by Taiho Industries Co., Ltd., and Comparative Example 10 is magnetic fluid MSGW08 manufactured by Ferrotec Corporation . Comparative Example 11 is mag...

Embodiment 31~38

[0169] The preparation of the polishing composition and the magnetic polishing were carried out in the same manner as in Example 5, except that the type and content of the anticorrosion agent were different (see Table 3).

[0170] It should be noted that BP in Table 3 is 2,2'-bipyridine, PT is 1,10-phenanthroline, TA is 1,2,4-triazole, and MBTABE is 2,2'-[[( Methyl-1H-benzotriazol-1-yl)methyl]imino]bisethanol, NBTA is 5-nitro-1H-benzotriazole, TEA is triethanolamine, PHDETA is N,N,N' ,N",N"-penta(2-hydroxypropyl)diethylenetriamine.

[0171] As can be seen from the results shown in Table 3, the polishing rate, scratches, gloss, and haze were all good even if the types of anticorrosion agents were different.

[0172] [table 3]

[0173]

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Abstract

[Problem] To provide a polishing composition and magnetic polishing which are suitable not only for polishing objects made of hard materials but also objects to be polished made of soft metal materials, and which are less likely to cause surface defects such as scratches method. [Solution] The polishing composition (1) contains magnetic particles having a saturation magnetization of 20 emu / g or more and 150 emu / g or less, and water. A magnetic field is applied to the polishing composition (1) to form magnetic clusters (3) containing magnetic particles, and the magnetic clusters (3) are brought into contact with the polishing object (5) to polish the polishing object (5).

Description

technical field [0001] The present invention relates to a polishing composition, a method for producing the same, and a method for magnetic polishing. Background technique [0002] As a polishing method (for example, mirror finishing) for finishing the surface of a material with high precision, a magnetic polishing method is known. The magnetic polishing method is a polishing method in which a slurry containing a functional fluid that reacts with a magnetic field, such as a magnetic fluid, a magnetic viscosity fluid, and a magnetic mixed fluid, is used as a polishing composition, and a magnetic field is applied to the polishing composition to form magnetic clusters, and the magnetic The cluster is a polishing tool, and it is brought into contact with the object to be polished to perform polishing. [0003] For example, Patent Document 1 discloses a magnetic polishing method using a polishing composition containing magnetic particles, abrasive particles, a stabilizer for sta...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C09K3/14B24B1/00
CPCC09K3/14B24B1/005
Inventor 玉田修一若林谅安井大祐
Owner FUJIMI INCORPORATED