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Pulse power source for impact magnet

A technology of pulse power supply and magnet, which is applied in the direction of electric pulse generator circuit, energy storage element to generate pulse, etc., can solve the problem that the repetition frequency of pulse power supply is difficult to be higher than kilohertz and so on.

Pending Publication Date: 2019-11-01
SHANGHAI ADVANCED RES INST CHINESE ACADEMY OF SCI
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  • Abstract
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AI Technical Summary

Problems solved by technology

The existing pulse power supply for impacting magnets adopts the form of charging and storing energy first and then triggering the conduction of the discharge circuit to form a pulse waveform in the circuit form. This circuit form generally uses a DC current source to charge the energy storage component. Therefore, the pulse power supply Each cycle of work includes charging time and discharging time. This design scheme makes it difficult for the repetition frequency of pulse power to be higher than several thousand Hz

Method used

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  • Pulse power source for impact magnet
  • Pulse power source for impact magnet
  • Pulse power source for impact magnet

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Embodiment Construction

[0020] The present invention will be further described below in conjunction with specific embodiments. It should be understood that the following examples are only used to illustrate the present invention but not to limit the scope of the present invention.

[0021] like figure 1 Shown is a schematic diagram of a pulsed power supply 100 for impacting magnets according to one embodiment of the present invention. Wherein, the impact magnet L is used in the beam distribution system of the X-ray free electron laser device, which is the load of the pulse power supply and can be equivalent to an inductor. The pulse power supply 100 for impacting the magnet includes a voltage-stabilizing power supply 1, a switch control module 2 and a parallel waveform shaping module 3 connected in series with both ends of the impact magnet L through a high-voltage cable. The voltage-stabilizing power supply 1 is connected with an energy storage filter Module 4 is connected in parallel. In additio...

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Abstract

The invention provides a pulse power source for an impact magnet. The pulse power source includes a voltage stabilizing power source, a switch control module and a parallel waveform forming module sequentially connected in series with two ends of an impact magnet, wherein the switch control module includes at least one MOS switch tube connected with one end of the voltage stabilizing power source,and the parallel waveform forming module includes at least one set of main resistors and main capacitors connected in parallel with each other. The pulse power source is advantaged in that the pulsepower source is based on an LRC second-order hybrid circuit, a first charging and then discharging pulse power source operation mode is avoided, the MOS switch tube is utilized as a current switch, anMOS switch tube conduction circuit forms step response while a leading edge and a top of the pulse current are generated, the MOSFET switch is turned off to form a trailing edge of the pulse current,so the repetition frequency of the pulse magnet power source can reach hundreds of kilohertz or even megahertz.

Description

technical field [0001] The invention belongs to the technical field of particle accelerator pulse power, in particular to a pulse power supply for impacting magnets. Background technique [0002] X-ray free-electron laser (XFEL) has the advantages of higher brightness and better coherence, making it a technical solution for the next generation of synchrotron radiation sources. A free electron laser is mainly composed of a linear accelerator and an undulator. The linear accelerator generates a high-quality electron beam, and the electron beam generates periodic motion when passing through the undulator to generate coherent light that meets the requirements. In order to meet the light requirements of different experimental users, a general free electron laser has several undulator lines. The distribution of electron beams to different undulator lines is realized through the beam distribution system. The function of the beam distribution system is to distribute the electron b...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H02M9/04
CPCH03K3/57
Inventor 刘永芳谷鸣袁启兵
Owner SHANGHAI ADVANCED RES INST CHINESE ACADEMY OF SCI