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Stripping liquid storage tank, photoresist stripping device and photoresist stripping method

A stripping liquid and storage tank technology, applied in the display field, can solve the problems of poor filtering effect of filters, easy residue of photoresist fragments on the substrate, affecting the yield and quality of display products, and achieve the effect of improving yield and quality

Inactive Publication Date: 2020-01-03
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] However, the filtering effect of the filter is poor, resulting in more photoresist fragments remaining in the filtered stripping liquid. When the filtered stripping liquid is reused, the photoresist fragments in the stripping liquid tend to remain on the substrate. on, affecting the yield and quality of display products

Method used

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  • Stripping liquid storage tank, photoresist stripping device and photoresist stripping method
  • Stripping liquid storage tank, photoresist stripping device and photoresist stripping method
  • Stripping liquid storage tank, photoresist stripping device and photoresist stripping method

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Embodiment Construction

[0036] In order to make the purpose, technical solution and advantages of the present application clearer, the implementation manners of the present application will be further described in detail below in conjunction with the accompanying drawings.

[0037] During the manufacturing process of display products, the photoresist on the substrate to be stripped can be stripped by photoresist stripping equipment. Photoresist stripping equipment usually includes a stripping liquid storage tank, a filter, a liquid suction pump and a stripping chamber, and the liquid suction pump is used to extract the stripping liquid in the stripping liquid storage tank and spray it onto the substrate to be stripped in the stripping chamber. The photoresist on the substrate is stripped, the filter is used to filter the stripping liquid flowing from the stripping chamber to the filter, and the filtered stripping liquid is introduced into the stripping liquid storage tank, so that the stripping liquid...

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Abstract

The invention provides a stripping liquid storage tank, a photoresist stripping device and a photoresist stripping method, and belongs to the technical field of display. The stripping liquid storage tank comprises a tank body and an adsorption filtering assembly fixed in the tank body, the tank body is provided with a liquid inlet and a liquid outlet, and the adsorption filtering assembly is located between the liquid inlet and the liquid outlet; and the adsorption filtering assembly comprises an adsorption layer, and the adsorption layer is used for adsorbing photoresist fragments in a stripping liquid entering the tank body from the liquid inlet and flowing to the liquid outlet. The adsorption layer in the adsorption filtering assembly can adsorb the photoresist fragments in the stripping liquid, so the residual photoresist fragments in the stripping liquid passing through the adsorption filtering assembly are few, and when the stripping liquid is used for stripping the photoresist again, the residual photoresist fragments on ae substrate are few, and improvement of the yield and quality of display products is facilitated.

Description

technical field [0001] The present application relates to the field of display technology, in particular to a stripping liquid storage tank, photoresist stripping equipment and method. Background technique [0002] The process of display products usually includes front-end process, middle-end process and back-end assembly process. The front-end process is mainly used to make functional graphics on the substrate. In the front-end process, first deposit a thin film on the substrate and coat the photoresist on the film, then sequentially expose and develop the photoresist to obtain a photoresist pattern, then etch the film under the shadow of the photoresist pattern, and finally pass Photoresist stripping equipment strips photoresist patterns to obtain functional patterns. [0003] In the related art, photoresist stripping equipment usually includes a stripping liquid storage tank, a filter, a liquid suction pump and a stripping chamber, the liquid outlet of the filter communi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D36/00B08B1/02B08B3/02B08B3/08B08B1/20
CPCB01D36/00B08B3/022B08B3/08B08B1/20
Inventor 李洋王云志罗云
Owner BOE TECH GRP CO LTD