Manufacturing method of patterned substrate, patterned substrate and light emitting diode
A patterned substrate and manufacturing method technology, applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve the problems of long modification time, low production capacity, and unsatisfactory production, so as to shorten the process time, The effect of increasing productivity
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0030] The specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings. It should be understood that the specific embodiments described herein are only used to illustrate and explain the present invention, and not to limit the present invention.
[0031] Such as figure 1 As shown, the first aspect of the present invention relates to a manufacturing method of a patterned substrate, including:
[0032] Initial stage: forming a patterned mask with initial topography on the substrate.
[0033] Specifically, in this step, a patterned mask with an initial topography is formed, for example, figure 1 As shown in the pattern A in the figure, a layer of photoresist can be formed on the substrate 1, and the photoresist can be exposed and developed to finally form a patterned mask 2 with an initial topography, such as figure 1 As shown in the figure A, the longitudinal section of the initial topography of the patterned mask 2 is rec...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 


