A workpiece table system and photolithography equipment

Abstract

The invention discloses a workpiece platform system and lithography equipment. The workpiece platform system includes a basic frame, a base, a moving component, a balance mass component, a gravity compensation device and a transmission device; the base is fixed on the basic frame; the moving component is used for The movement of the stage provides the driving force; the balance mass assembly is movably arranged on the base frame; the stator part of the movement assembly is fixed on the balance mass assembly, and the mover part drives the stage to move relative to the stator part, and its reverse force drives The balance mass assembly moves in the opposite direction; the gravity compensation device is located between the base frame and the base, and is used for vertical gravity compensation of the load on the base; the balance mass assembly drives the gravity compensation device through the transmission device to synchronize with the stage sports. On the premise of not increasing the thickness of the base, the invention uses the balance mass to drive the gravity compensation device to perform real-time gravity compensation for the load on the base, reducing or even eliminating the deformation of the base caused by the movement of the load.

Description

technical field [0001] Embodiments of the present invention relate to the technical field of semiconductor manufacturing equipment, and in particular, to a workpiece stage system and photolithography equipment. Background technique [0002] A lithography apparatus is a device that exposes and images a mask pattern onto a silicon wafer, and is mainly used in the manufacture of integrated circuits (ICs) or other microdevices. The workpiece table system plays a very important role in the lithography device. In the stepping and scanning lithography machine, the workpiece table is used to carry the silicon wafer and perform precise movement to meet the lithography needs. In lithography equipment, the workpiece table is responsible for the precise movement of the silicon wafer. Generally, the coarse and micro positioning method is adopted, that is, the long-stroke coarse motion table realizes long-distance coarse positioning, while the micro motion table realizes nanometer-level p...

AI Technical Summary

Problems solved by technology

However, with the advancement of technology, the weight and running speed of the stroke assembly will increase accordingly. Simply increasing the thickness of the base 50 can no longer meet the requirements of exposure accuracy, and it also increases the difficulty of the design of the workpiece table.

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