Workpiece table system and photoetching equipment

Abstract

The invention discloses a workpiece table system and photoetching equipment. The workpiece table system comprises a foundation frame, a base, a motion assembly, a balance mass assembly, a gravity compensation device and a transmission device; the base is fixed on the foundation frame; the motion assembly is used for providing a driving force for the movement of an object carrying table; the balance mass assembly is movably arranged on the foundation frame; the stator part of the motion assembly is fixed on the balance mass assembly; the rotor part of the motion assembly drives the object carrying table to move relative to the stator part; the reverse acting force of the stator part drives the balance mass assembly to move in a reverse direction; the gravity compensation device is located between the foundation frame and the base and is used for conducting vertical gravity compensation on a load on the base; and the balance mass assembly drives the gravity compensation device through the transmission device so as to make the gravity compensation device move synchronously with the object carrying table in a direction the same as the object carrying table. According to the workpiece table system and the photoetching equipment of the invention, on the premise that the thickness of the base is not increased, the balance mass assembly is used for driving the gravity compensation device to conduct real-time gravity compensation on the load on the base, and therefore, the deformation of the base caused by the movement of the load is reduced or even eliminated.

Description

technical field [0001] Embodiments of the present invention relate to the technical field of semiconductor manufacturing equipment, and in particular, to a workpiece stage system and photolithography equipment. Background technique [0002] A lithography apparatus is a device that exposes and images a mask pattern onto a silicon wafer, and is mainly used in the manufacture of integrated circuits (ICs) or other microdevices. The workpiece table system plays a very important role in the lithography device. In the stepping and scanning lithography machine, the workpiece table is used to carry the silicon wafer and perform precise movement to meet the lithography needs. In lithography equipment, the workpiece table is responsible for the precise movement of the silicon wafer. Generally, the coarse and micro positioning method is adopted, that is, the long-stroke coarse motion table realizes long-distance coarse positioning, while the micro motion table realizes nanometer-level p...

AI Technical Summary

Problems solved by technology

However, with the advancement of technology, the weight and running speed of the stroke assembly will increase accordingly. Simply increasing the thickness of the base 50 can no longer meet the requirements of exposure accuracy, and it also increases the difficulty of the design of the workpiece table.

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