Contact deliquescene polishing device and polishing method for plasma modified liquid film

Abstract

The invention provides a contact deliquescene polishing device for a plasma modified liquid film. The device comprises an object carrying block, a heavy object, a polishing pad, a polishing disc, a first hose, a second hose, a plasma generating device and a micro-mist generating device, wherein the polishing pad is mounted on the upper surface of the polishing disc, and the object carrying block is arranged above the polishing disc; and the heavy object is arranged on the object carrying block, wherein the object carrying block and the heavy object are used for applying pressure to a deliquescent crystal, through holes are formed in the positions, corresponding to the deliquescent crystal, of the polishing disc and the polishing pad, and the plasma generating device and the micro-mist generating device correspondingly communicate with the through holes through the first hose and the second hose. The invention further provides a polishing method for the plasma modified liquid film. Thecontact deliquescene polishing device and polishing method for the plasma modified liquid film has the beneficial effects that the problems that micro-pits and residual organic matters are difficult to clean caused by residing of liquid drops and the like in an existing deliquescence polishing method can be solved.

Description

【Technical field】 [0001] The invention relates to the technical field of ultra-precision processing of the surface of a deliquescent crystal, in particular to a plasma-modified liquid film contact deliquescent polishing device and a polishing method. 【Background technique】 [0002] In the current stage of micromachining, medical diagnosis, inertial confinement nuclear fusion and other experiments, some deliquescent optical crystals play an important role, including but not limited to LBO crystals, CBO crystals, KDP crystals, CLBO crystals, etc. Most of these deliquescent crystals are soft and brittle, sensitive to temperature changes, easy to crack, and anisotropic, making it difficult to achieve ultra-precision machining of the crystal surface. At present, there are the following problems in the ultra-precision processing of deliquescent crystals: 1) Small-scale ripples on the SPDT processed surface are unavoidable, difficult to repair surface micro-defects, and low process...

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to disclose a plasma-modified liquid film contact deliquescent polishing device and polishing method, which can solve the technical problems of micro-pits and residual organic matter that are difficult to clean due to the residence of deliquescent polishing droplets in traditional deliquescent crystals.

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