Chuck polishing device with revolving and rotation

A polishing device and chuck technology, which is applied to the device for fixing the grinding wheel, the grinding drive device, and the grinding/polishing equipment, etc., can solve the problems of difficult disassembly and replacement of the grinding plate, difficult fixed installation, and single rotation method. Enhanced functionality, improved usability, improved robustness

Inactive Publication Date: 2020-01-21
常州明全机械有限公司
View PDF11 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to provide a chuck polishing device with revolution and rotation to solve the problem of single rotation mode, poor polishing effect, difficult fixed installation and large noise pollution, simple structure, difficult disassembly of the grinding plate and problems in the background technology. replacement problem

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Chuck polishing device with revolving and rotation
  • Chuck polishing device with revolving and rotation
  • Chuck polishing device with revolving and rotation

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0022] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0023] see Figure 1-4 , an embodiment provided by the present invention: a chuck polishing device with revolution and rotation, including a muffler cover 4, a first drive motor 5, a first fixed mount 6 and a second fixed mount 14, the first fixed mount 6 The bottom end is evenly provided with mounting feet 3, and there are 4 mounting feet 3. An integrated welding structure is formed between the mounting feet 3 and the first fixing frame 6, and the mounting fe...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a chuck polishing device with revolving and rotation. The device comprises a silencing cover, a first driving motor, a first fixed frame and a second fixed frame; and mountingfeet are uniformly arranged at the bottom end of the first fixed frame. As the device is provided with the first driving motor, the second fixed frame, a second driving motor, a belt, a driving wheel,a driven wheel and polishing plates, on the one hand, the first driving motor drives the second fixed frame to rotate to realize revolving of multiple polishing plates to achieve a polishing function; and on the other hand, the second driving motor drives the driving wheel to rotate, and the driven wheel is driven to rotate by using the effect of the belt to realize rotation of the multiple polishing plates to further achieve the polishing function; and the revolving and the rotation are synchronously realized through control of the polishing plates to achieve no-dead-angle polishing, so thatthe product polishing uniformity is guaranteed, and the use effect of the device is improved.

Description

technical field [0001] The invention relates to the technical field of polishing devices, in particular to a chuck polishing device with revolution and rotation. Background technique [0002] The chuck is a mechanical device used to clamp the workpiece on the machine tool. Polishing is one of the more important steps in its production process. A chuck polishing device is needed in this processing step, but the existing chuck polishing The device still has the following problems in concrete use: [0003] 1. The existing chuck polishing device generally has the problem of single rotation mode and poor polishing effect, which leads to poor use effect of the device; [0004] 2. The existing chuck polishing devices often have the disadvantages of not being easy to install and causing high noise pollution, which leads to poor functionality of the device and is not conducive to the long-term promotion of the device; [0005] 3. The existing chuck polishing devices on the market s...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B24B29/02B24B27/00B24B47/12B24B41/02B24B41/00B24B41/04B24B45/00
CPCB24B27/0076B24B29/02B24B41/00B24B41/02B24B41/04B24B45/003B24B47/12
Inventor 周明照周蓉
Owner 常州明全机械有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products