Cyanide-free alkaline cuprous plating additive
An additive and cuprous technology, which is applied in the field of cyanide-free alkaline cuprous copper plating additives, can solve the problems of difficult direct electroplating and passivation of steel substrates, and achieve the effects of easy deposition, refined metal crystals, and inhibition of discharge precipitation
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Embodiment 1
[0021] A cyanide-free alkaline cuprous copper plating additive, the additive composition is as follows: 50 parts of complexing agent, 0.1 part of stabilizer, 0.01 part of brightener, 0.1 part of leveling agent, 10 parts of NaOH, NaOH 2 CO 3 5 parts, 15 parts of cuprous compound, the selected brightener and leveling agent can be adsorbed on the surface of the cathode, exerting a synergistic effect, inhibiting the discharge and precipitation of metal ions, thereby refining the metal crystal, and the leveling agent can slowly desorb on the surface of the electrode And adsorption, the adsorption concentration at the microscopic peak on the cathode surface is higher than that at the microscopic low peak, so that the precipitation of metal ions at the peak is more inhibited, making it easier to deposit at the low peak, showing leveling .
[0022] The main components of the complexing agent are the reaction product of organic amine and carbon disulfide or thiourea and derivatives t...
Embodiment 2
[0037] A cyanide-free alkaline cuprous copper plating additive, the additive is composed as follows: 200 parts of complexing agent, 20 parts of stabilizer, 0.5 part of brightener, 5 parts of leveling agent, 20 parts of NaOH, NaOH 2 CO 3 20 parts, 50 parts of cuprous compound, the selected brightener and leveling agent can be adsorbed on the surface of the cathode, exert a synergistic effect, inhibit the discharge and precipitation of metal ions, thereby refining the metal crystals, and the leveling agent can slowly dissolve on the surface of the electrode Desorption and adsorption, the adsorption concentration at the microscopic peak on the cathode surface is higher than that at the microscopic low peak, so that the precipitation of metal ions at the peak is more inhibited, making it easier to deposit at the low peak, showing leveling sex.
[0038]The main components of the complexing agent are the reaction product of organic amine and carbon disulfide or thiourea and deriva...
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