Monitoring method and monitoring equipment for monocrystal diamond growth process

A single crystal diamond, growth process technology, applied in measurement devices, instruments, optical devices, etc., can solve the problems of inability to monitor the growth of single crystal diamond, cost waste, and inability to observe polycrystals or inclusions in real time.

Pending Publication Date: 2020-02-21
CR GEMS SUPERABRASIVES
View PDF0 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to provide a monitoring method and monitoring equipment for the growth process of single crystal diamond, so as to solve the problem that in the prior art, it is imposs

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Monitoring method and monitoring equipment for monocrystal diamond growth process
  • Monitoring method and monitoring equipment for monocrystal diamond growth process
  • Monitoring method and monitoring equipment for monocrystal diamond growth process

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0119] A monitoring method (single single crystal diamond) of a single crystal diamond growth process, comprising the steps:

[0120] 1) Before the growth of single crystal diamond, the mobile thickness monitoring equipment performs optical thickness measurement on the surface of single crystal diamond seed crystal (8mm*8mm), and obtains the initial thickness and position data corresponding to each detection point on the surface of single crystal diamond;

[0121] 2) During the growth process of single crystal diamond, the mobile thickness monitoring equipment performs optical thickness measurement on the surface of single crystal diamond, and obtains the corresponding thickness and position data of each detection point on the surface of single crystal diamond during the growth process;

[0122] 3) According to the thickness and position data corresponding to each detection position on the initial single crystal diamond surface obtained in step 1), and the thickness and positio...

Embodiment 2

[0130] A monitoring method (simultaneously growing 9 single crystal diamonds) of a single crystal diamond growth process, comprising the steps:

[0131] 1) Before the growth of single crystal diamond, the mobile thickness monitoring equipment performs optical thickness measurement on the surface of single crystal diamond seed crystal (8mm*8mm), and obtains the initial thickness and position data corresponding to each detection point on the surface of single crystal diamond;

[0132] 2) During the growth process of single crystal diamond, the mobile thickness monitoring equipment performs optical thickness measurement on the surface of single crystal diamond, and obtains the corresponding thickness and position data of each detection point on the surface of single crystal diamond during the growth process;

[0133] 3) According to the thickness and position data corresponding to each detection position on the initial single crystal diamond surface obtained in step 1), and the th...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a monitoring method and monitoring equipment for a monocrystal diamond growth process. The monitoring method comprises the following steps: 1, before the growth of the monocrystal diamond: moving thickness monitoring equipment to measure the optical thickness on the surface of a monocrystal diamond seed crystal to obtain initial thickness and position data corresponding to each detection position on the surface of the monocrystal diamond; and 2, in the growth process of the monocrystal diamond: moving the thickness monitoring equipment to perform optical thickness measurement on the surface of the monocrystal diamond to obtain thickness and position data corresponding to each detection position on the surface of the monocrystal diamond in the growth process. The monitoring equipment comprises the thickness monitoring equipment. The thickness monitoring equipment comprises a thickness monitoring part and an objective lens; the thickness monitoring part is connected with the objective lens and a mobile platform and used for obtaining thickness and position data corresponding to each detection position on the surface of the monocrystal diamond. According to themonitoring method and equipment, the thickness of the monocrystal diamond can be monitored in real time, and whether production needs to be stopped or not can be determined once obvious changes can beobserved locally in the height direction.

Description

technical field [0001] The invention relates to the technical field of single crystal diamond, in particular to a monitoring method and monitoring equipment for the growth process of single crystal diamond. Background technique [0002] When using microwave plasma chemical vapor deposition equipment, that is, MPCVD (Microwave Plasma Chemical Vapor Deposition) to grow carat-level single crystal diamond, after the seed crystal is placed in the CVD equipment, it needs to grow for a long time of about 10-15 days. , Seed crystal quality, external environmental factors and other conditions, it is very easy to have polycrystalline growth, black carbon inclusions, and internal stress problems at a certain point in time, which in turn affects product yield and increases costs. However, diamond is at a high temperature of about 1000°C, and the existing observation methods (mainly naked eye observation) cannot observe whether there are polycrystalline growths. That is to say, once the ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G01B11/00G01B11/06G01B11/24
CPCG01B11/00G01B11/06G01B11/2441
Inventor 王垒温简杰
Owner CR GEMS SUPERABRASIVES
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap