Preparation method for silicon nitride film, solar cell with silicon nitride film and preparation method for solar cell
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- YINGLI ENERGY CHINA
- Publication Date
- 2014-12-31
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Figure 1
Abstract
Description
technical field
[0001] The invention relates to the field of solar cells, in particular to a method for preparing a silicon nitride film, a solar cell with a silicon nitride film and a method for preparing the same. Background technique
[0002] A solar cell, also called a photovoltaic cell, is a semiconductor device that converts the sun's light directly into electrical energy. Because it is a green product, does not cause environmental pollution, and is a renewable resource, solar cells are an energy source with broad development prospects in today's energy shortage situation. The manufacturing process of solar cells generally has the following steps: chemical cleaning and surface texture treatment, diffusion junction, peripheral etching, silicon nitride film deposition, screen printing, and sintering. In the silicon nitride film deposition step, plasma-enhanced chemical vapor deposition (PECVD) is a commonly used method for preparing silicon nitride films.
[0003] Plas...