Mask plate detection device and method, and mask plate library equipment
A detection device and a mask technology, which are applied in the direction of photolithography exposure device, photomechanical equipment, microlithography exposure equipment, etc., can solve the problems of high assembly precision, cumbersome assembly process steps, and large space occupation. Reach the effect of reducing assembly precision requirements, saving energy consumption, and reducing occupied space
Active Publication Date: 2021-07-30
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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Problems solved by technology
[0006] The invention provides a mask detection device and method, and mask library equipment to solve the problem that the existing mask library equipment has a large number of mask detection devices, occupies a large space, and requires high assembly accuracy , and the cumbersome steps of the assembly process
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[0050] The present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, but not to limit the present invention. In addition, it should be noted that, for the convenience of description, only some structures related to the present invention are shown in the drawings but not all structures.
[0051] refer to figure 1 , figure 1 It is a structural schematic diagram of a mask inspection device provided in the prior art. The current mask detection method is to use a through-beam optical fiber sensor for detection. An optical fiber sensor-type transmitter 5 and a receiver 6 are placed at opposite ends of the mask groove 2. When no mask is placed on the mask groove 2 When the stencil is used, the receiver 6 can receive the strong light signal emitted by the transmitter 5. When the mask plate is placed on ...
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The embodiment of the invention discloses a mask plate detection device and method, and mask plate library equipment. Wherein, the mask plate detection device includes: a light source module, a mask plate detection module and a signal processing module; the light source module includes a first multiplex switch and a plurality of first light sources; the first multiplex switch is used to control the first A light source emits first detection light; the mask plate detection module includes a second multiplex strobe switch and a plurality of first sensors; the first sensor is used to receive the first detection light and convert it into a first detection electrical signal; the second multiple The gate switch is used to control the first sensor to receive the first detection light; the signal processing module is used to obtain the first detection electric signal of the first sensor and judge whether there is a reticle in the reticle slot where the first sensor is located. The technical solutions provided by the embodiments of the present invention can solve the problems that the existing mask library equipment has a large number of mask detection devices, occupies a large space, and requires high assembly precision.
Description
technical field [0001] Embodiments of the present invention relate to the technical field of semiconductor manufacturing, and in particular to a mask inspection device and method, and mask library equipment. Background technique [0002] Lithography equipment is a device that exposes and images the pattern on the reticle onto the substrate. The lithography equipment needs to be equipped with mask library equipment: external library equipment and internal version library equipment, which are used to place masks respectively . Wherein, the external plate storage device is an interface for the lithography equipment to receive the reticle, and the internal plate storage device is a device for storing the reticle inside the lithography equipment. The external plate library device is the mask interface of the lithography equipment. The user places the mask plate with the mask plate on the external plate library device. After the external plate library device detects the mask plat...
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IPC IPC(8): G03F7/20
CPCG03F7/70741G03F7/7085
Inventor 唐文力祝玥华吴钱忠朱骏宇陈淮阳
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD