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Mask plate, splicing exposure method and substrate

An exposure method and mask technology, applied in the field of mask exposure, can solve the problems of split screen display, uneven display brightness, etc.

Active Publication Date: 2020-04-17
YUNGU GUAN TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] Based on this, it is necessary to provide a mask plate, a splicing exposure method and a substrate for improving the problems of uneven display brightness or split-screen display in the splicing area.

Method used

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  • Mask plate, splicing exposure method and substrate
  • Mask plate, splicing exposure method and substrate
  • Mask plate, splicing exposure method and substrate

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Embodiment Construction

[0047] In order to facilitate the understanding of the present application, the present application will be described more fully below with reference to the relevant drawings. Preferred embodiments of the application are shown in the accompanying drawings. However, the present application can be embodied in many different forms and is not limited to the embodiments described herein. On the contrary, the purpose of providing these embodiments is to make the understanding of the disclosure of the application more thorough and comprehensive.

[0048] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the technical field to which this application belongs. The terms used herein in the specification of the application are only for the purpose of describing specific embodiments, and are not intended to limit the application. As used herein, the term "and / or" includes any and all combinati...

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Abstract

The invention relates to a mask plate, a splicing exposure method and a substrate, and the mask plate comprises: a first mask plate which is provided with a first shading region which comprises a first non-splicing segment and a first splicing segment, wherein the first non-splicing segment and the first splicing segment are connected with each other in a first direction; a second mask plate whichis provided with a second shading area, wherein the second shading area comprises a second non-splicing segment and a second splicing segment which are connected with each other in the first direction, the line widths of the first non-splicing segment and the second non-splicing segment in the second direction are equal, and the previous projection of the first non-splicing segment on the planewhere the film layer to be exposed is located and the later projection of the second non-splicing segment on the plane where the film layer to be exposed is located are staggered in the second direction, the line width of at least one of the first splicing segment and the second splicing segment is greater than that of the first non-splicing segment, the first direction and the second direction are perpendicular to each other and parallel to the mask plate. Therefore, the line widths of the virtual patterns formed on the photoresist layer at all positions are equal, and the line widths of thefinally formed metal patterns are ensured to be equal.

Description

technical field [0001] The invention relates to the technical field of mask exposure, in particular to a mask plate, a splicing exposure method and a substrate. Background technique [0002] With the continuous development of display technology, the size of the display screen is constantly increasing. In order to increase the size of the display screen, the size of the mask needs to be increased accordingly. However, due to the limitation of the size of the mask by the exposure machine, and many problems such as manufacturing difficulty, high cost and inconvenient storage of the large-size mask, the manufacture of the large-size mask is limited. [0003] In order to produce a larger-sized display screen, a smaller-sized mask is often used for mask exposure, but the area of ​​the effective exposure area of ​​the smaller-sized mask is smaller than the area of ​​the display screen, so the splicing exposure method must be used Prepare larger-sized display screens. [0004] How...

Claims

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Application Information

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IPC IPC(8): G03F1/38G03F7/22G03F7/20
CPCG03F1/38G03F7/22G03F7/70475Y02P70/50
Inventor 张振宇顾维杰马晓飞陈亚坤
Owner YUNGU GUAN TECH CO LTD
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