67results about How to "Uniform line width" patented technology

A pattern forming method is provided for forming film patterns W1 to W3 by arranging droplets of a liquid material on a substrate. The method comprises the steps of: defining a plurality of pattern forming areas R1 to R3 in which the film patterns should be formed on the substrate; and sequentially arranging a plurality of droplets in the plurality of defined pattern forming areas R1 to R3, thereby forming the film patterns W1 to W3, wherein the droplets are sequentially arranged by setting an arrangement order of the droplets to be substantially equal for the plurality of pattern forming areas R1 to R3.

In a coating and developing apparatus that forms a resist film on substrates such as semiconductor wafers, and develops substrates exposed by an aligner, times after the aligner unloads substrates until heating units (PEB) start heating the substrates are kept uniform. Exposed wafers are prevented from being left stagnant in an interface portion disposed between a region in which resist is coated and developed and the aligner. In the region in which resist is coated and developed, a first transferring means that successively executes transportation cycles to transfer substrates from upstream side modules to downstream side modules in a flow of processes of substrates. N heating units (PEB) are disposed (n is for example 5). Exposed wafers loaded into the heating units (PEB) are unloaded by the first transferring means after (n−1) cycles including the transferring cycle of the first transferring means have elapsed.

A method of forming a fine pattern of a semiconductor device using double SPT process, which is capable of implementing a line and space pattern having a uniform fine line width by applying a double SPT process including a negative SPT process, is provided. The method includes a first SPT process and a second SPT process and the second SPT process includes a Negative SPT process.

A double exposure process is performed using a halftone phase shift mask (11) including gate patterns (1), assist patterns (2a) and (2b) with different resoluble line widths, and an assist pattern (2c) with a line width equal to or smaller than a resolution limit which are respectively inserted into portions in each of which a distance between the gate patterns (1) is large, and a Levenson phase shift mask (11) including shifter patterns (3) corresponding to the gate patterns (1) of the photomask 11. On this occasion, the assist patterns (2a), (2b), and (2c) are erased and only the gate patterns (1) are transferred. Consequently, when patterns are transferred by the double exposure process, a common depth of focus of the patterns is improved and highly uniform line widths are realized, which makes it possible to manufacture a highly reliable semiconductor device.

A variable slit device for forming illumination light having a slit shape extending in a longitudinal direction and a lateral direction. A first light intensity setting unit sets a first light intensity distribution, which is the light intensity distribution of a peripheral portion, which is one of a pair of peripheral portions extending along the longitudinal direction of the slit shape. A second light intensity setting unit sets a second light intensity distribution, which is the light intensity distribution of a peripheral portion, which is the other one of the pair of peripheral portions. Selection members select a first portion of a light beam that has the first light intensity distribution and a second portion of the light beam that has the second light intensity distribution.

A method extends the use of phase shift techniques to complex layouts, and includes identifying a pattern, and automatically mapping the phase shifting regions for implementation of such features. The pattern includes small features having a dimension smaller than a first particular feature size, and at least one relatively large feature, the at least one relatively large feature and another feature in the pattern having respective sides separated by a narrow space. Phase shift regions are laid out including a first set of phase shift regions to define said small features, and a second set of phase shift regions to assist definition of said side of said relatively large feature. An opaque feature is used to define the relatively large feature, and a phase shift region in the second set is a sub-resolution window inside the perimeter of the opaque feature.

The invention discloses a method for preparing a superconductive nanometer device by a negative electron beam resist exposure process. The method mainly comprises the following steps of: spinning a hydrogen silsesquioxane (HSQ) resist on a superconductive thin film; pre-drying; designing an exposure graph; exposing by two steps; developing; fixing; and etching. By using the method, the superconductive nanometer device which is stable in performance and uniform in line width and has the minimum line width of 15 nm can be prepared. Residues do not exist in an electrode region after the etching step is performed by setting an exposure amount in different regions and changing the thickness of an exposure product in the corresponding region, so that electrical measurement is facilitated. HSQ has high anti-etching performance and is suitable to serve as an etching mask of a hard superconductive metal material, so that the etching selection ratio can be increased. An electrode and the device are obtained through one-time etching; no contact potential difference exists between the electrode and the device; and the success rate of the device is high. Furthermore, a plurality of independent micro electric bridges are exposed on the same thin film, so that the efficiency of integrating and measuring the electric bridges can be improved, and the material utilization rate is increased; and the superconductive nanometer device has great significance for research on nanometer structures made of rare materials.

A pattern forming method comprises the steps that a film layer and an etching barrier layer placed on the film layer are formed on a substrate; a plurality of first patterns, which are arrayed in parallel at equal intervals, of a first line are formed on the etching barrier layer; a second line is formed on the side wall of the first line, wherein the line width of the second line is equal to the line width of the first line, and the second line is made of materials different from that of the first line; a third line is formed in the side wall of the second line, and the line width of the third line is equal to the line width of the first line; a fourth line is arranged on the side wall of the third line in an epitaxial growth mode, the line width of the fourth line is equal to the line width of the first line, and the fourth line is made of materials different from that of the third line; the parts, which are not covered with the first line, the second line, the third line and the fourth line, of the etching barrier layer are removed to expose the film layer; a fifth line is arranged on the film layer in an epitaxial growth mode, and the fifth line is made of materials different from that of the fourth line; the second line and the fourth line are removed, and the patterns which are finally formed comprise the first line, the second line and the fifth line. The patterns have even array density and a good line width, and therefore a semiconductor device formed by the patterns is good in performance.

The present invention relates to a method for forming electrode patterns. The method for forming the electrode patterns of the present invention is applicable to various devices which require microelectrode patterning and, particularly, is useful to be applicable to forming a touch sensor provided in a touch screen panel (TSP).

The invention relates to a mask plate, a splicing exposure method and a substrate, and the mask plate comprises: a first mask plate which is provided with a first shading region which comprises a first non-splicing segment and a first splicing segment, wherein the first non-splicing segment and the first splicing segment are connected with each other in a first direction; a second mask plate whichis provided with a second shading area, wherein the second shading area comprises a second non-splicing segment and a second splicing segment which are connected with each other in the first direction, the line widths of the first non-splicing segment and the second non-splicing segment in the second direction are equal, and the previous projection of the first non-splicing segment on the planewhere the film layer to be exposed is located and the later projection of the second non-splicing segment on the plane where the film layer to be exposed is located are staggered in the second direction, the line width of at least one of the first splicing segment and the second splicing segment is greater than that of the first non-splicing segment, the first direction and the second direction are perpendicular to each other and parallel to the mask plate. Therefore, the line widths of the virtual patterns formed on the photoresist layer at all positions are equal, and the line widths of thefinally formed metal patterns are ensured to be equal.

An etching method in a semiconductor device includes forming a nitride-based first hard mask layer over a target etch layer, forming a carbon-based second hard mask pattern over the first hard mask layer, etching the first hard mask layer using the second hard mask pattern as an etch barrier to form a first hard mask pattern, cleaning a resultant structure including the first hard mask pattern, and etching the target etch layer using the second hard mask pattern as an etch barrier.

The invention provides a mask plate and an exposure method. The mask plate comprises a first mask pattern and a second mask pattern which are complementary, wherein the first mask pattern comprises aplurality of first strip-shaped patterns extending along a first direction; the second mask pattern comprises a plurality of second strip-shaped patterns extending along a second direction; the firstdirection is crossed with the second direction; in the exposure method, the first mask pattern and the second mask pattern are employed respectively to sequentially execute twice exposure processes onthe LED substrate, so that after alignment overlapping of the formed exposure patterns, a PSS pattern can be generated; compared with a traditional splicing mode, the method has the advantages that the line widths of all the pattern areas are consistent, so that the requirement for image quality is lowered, and an exposure view field does not need to be reduced.

A line image forming method includes the steps of: ejecting a plurality of droplets of liquid sequentially from an inkjet head, the liquid containing a functional component; and depositing the droplets of the liquid onto a non-permeable medium, the deposited droplets becoming joined together on the non-permeable medium to form a line pattern of the liquid, wherein a receding contact angle of the liquid with respect to the non-permeable medium being not larger than 10°.

The invention discloses a photomask with a novel three-layer-film structure, and a preparation method thereof. The photomask with the novel three-layer-film structure comprises a glass substrate, a barrier layer, a shading film layer, and an antireflection film layer. At least one layer in the three layers of films comprises a carbon component. According to the preparation method, one or more Cr target materials are provided; with a vacuum magnetron sputtering method, the barrier layer, the shading film layer, and the antireflection film layer are respectively plated on the glass substrate. With the method provided by the invention, a recess problem caused by sodium ion diffusion can be solved. Compared with a three-layer-film structure in prior art, the photomask with the novel three-layer-film structure can ensure etching time and good etching speed. Also, only one Cr target material is needed to be provided during the preparation process.