Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Device for preventing photoresist backflow and using method thereof

A photoresist and photoresist bottle technology, applied in electrical components, semiconductor/solid-state device manufacturing, circuits, etc., can solve problems such as photoresist reflow, and achieve the effects of less increase, convenient operation, and improved cleanliness.

Pending Publication Date: 2020-04-21
SHENYANG KINGSEMI CO LTD
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In order to solve the problem of photoresist backflow, the object of the present invention is to provide a device for preventing photoresist backflow and its use method

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Device for preventing photoresist backflow and using method thereof
  • Device for preventing photoresist backflow and using method thereof
  • Device for preventing photoresist backflow and using method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0020] The present invention will be described in further detail below in conjunction with the accompanying drawings.

[0021] Such as Figure 1~3 As shown, the device for preventing photoresist reflux of the present invention includes a photoresist pipeline 1, a photoresist bottle cap 2, a photoresist bottle 3, an air-proof pipe plug 4, a photoresist bottle supporting plate 5 and a load cell 6, wherein the photoresist bottle 3 is placed on the photoresist bottle supporting board 5, and the bottom of the photoresist bottle supporting board 5 is equipped with a weighing sensor 6.

[0022] The photoresist pipeline 1 is fixedly installed on the photoresist bottle cap 2, and then installed on the photoresist bottle 3 together with the photoresist bottle cap 2; the end of the photoresist pipeline 1 extends into the photoresist bottle 3, and the photoresist tube The length of the road 1 extending into the photoresist bottle 3 can be adjusted; the end of the photoresist line 1 locat...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a device for preventing photoresist backflow and a using method thereof. The device comprises a photoresist pipeline, a photoresist bottle cap, a photoresist bottle, an anti-empty pipe plug, a photoresist bottle supporting plate and a weighing sensor, wherein the photoresist bottle is placed on the photoresist bottle supporting plate, and the weighing sensor is installed on the photoresist bottle supporting plate; the photoresist pipeline is installed on the photoresist bottle cap and extends into the photoresist bottle, the tail end, which is located in the photoresist bottle, of the photoresist pipeline is provided with the anti-empty pipe plug, and the upper surface of the anti-empty pipe plug is higher than the end face of an outlet in the tail end of the photoresist pipeline. According to the invention, the backflow of a photoresist in the pipeline can be prevented when the photoresist is replaced; on the one hand, the workload of follow-up pipeline bubbledischarging caused by the empty photoresist pipeline can be reduced, and the working efficiency is improved; and on the other hand, the waste of the photoresist is reduced, and the cost is saved.

Description

technical field [0001] The invention belongs to the field of photoresist treatment in a semiconductor processing system, and specifically relates to a device for preventing photoresist backflow when replacing a photoresist bottle and a method for using the same. Background technique [0002] In the semiconductor processing system, photoresist is an indispensable material for the gluing process in the photolithography stage. Generally speaking, the photoresist purchased by semiconductor manufacturers is stored in a photoresist bottle. During the gluing process, the photoresist bottle replacement is very frequent. When replacing the photoresist bottle, the photoresist in the photoresist line usually flows back into the photoresist bottle, so that on the one hand, a section of empty tube is formed in the photoresist line, and the air bubbles in the empty tube need to be removed when the subsequent process is carried out. Discharging takes manpower and time; on the other hand, ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): H01L21/027H01L21/67
CPCH01L21/0273H01L21/6715
Inventor 王玉政程虎
Owner SHENYANG KINGSEMI CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products