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Method and apparatus for determining positions of a plurality of pixels to be introduced in a substrate of a photolithographic mask

A photolithographic mask and pixel technology, applied in the direction of photolithography exposure device, microlithography exposure equipment, originals for photomechanical processing, etc., to achieve the effect of improving correction, improving or optimizing defect correction

Pending Publication Date: 2020-05-01
CARL ZEISS SMS GMBH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, there is room for further improvement of this defect correction process

Method used

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  • Method and apparatus for determining positions of a plurality of pixels to be introduced in a substrate of a photolithographic mask
  • Method and apparatus for determining positions of a plurality of pixels to be introduced in a substrate of a photolithographic mask
  • Method and apparatus for determining positions of a plurality of pixels to be introduced in a substrate of a photolithographic mask

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Embodiment Construction

[0168] Hereinafter, the present invention will be described more fully with reference to the accompanying drawings, in which exemplary embodiments of the invention are illustrated. However, the present invention can be modified in various forms, and is not limited to the embodiments described in this specification. Rather, these embodiments are provided so that the scope of the disclosure will be thorough, and will convey the scope of the invention to those skilled in the art.

[0169] In particular, the method of the present invention is described in the context of photolithographic masks. However, those skilled in the art will appreciate that the defined method is not limited to applications for correcting defective photolithographic masks. On the contrary, the inventive method is applicable to all transmissive optical elements corrected by introducing multiple pixels. Furthermore, the methods described in this application can also be applied to correct templates for nanoi...

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Abstract

The present invention refers to a method and an apparatus for determining positions of a plurality of pixels to be introduced into a substrate (110) of a photolithographic mask (100, 600) by use of alaser system (370), wherein the pixels serve to at least partly correct one or more errors of the photolithographic mask(100, 600). The method comprises the steps: (a) obtaining error data associatedwith the one or more errors (140, 145); (b) obtaining first parameters of an illumination system (350), the first parameters determining an illumination of the photolithographic mask (60) of the illumination system (350) when processing a wafer (460) by illuminating with the illumination system (350) using the photolithographic mask(100, 600); and (c) to determining the positions of the pluralityof pixels based on the error data and the first parameters.

Description

[0001] Cross References to Related Applications [0002] This application claims priority from German patent application DE 10 2018 218129.2 filed on October 23, 2018, the entire content of which is hereby incorporated by reference. technical field [0003] The present invention relates to the technical field of correcting one or more photolithographic mask errors. In particular, the invention relates to methods and apparatus for determining the location of a plurality of pixels incorporated into a photolithographic mask blank. Background technique [0004] Due to the ever-increasing integration density in the semiconductor industry, photolithography masks must project smaller and smaller structures onto the photosensitive layer, the photoresist on the wafer. To meet this requirement, the exposure wavelengths of photolithography masks have been extended from the near-ultraviolet to the average ultraviolet of the electromagnetic spectrum, and then shifted to the far-ultravio...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/38G03F1/42G03F7/20
CPCG03F7/7055G03F1/38G03F1/42G03F1/72G03F1/84G03F1/74G03F1/86G03F7/70441G03F7/70466G03F7/70625G03F1/60G03F7/70508
Inventor V.德米特里耶夫K.戈哈德J.韦尔特T.塞尔詹纽克
Owner CARL ZEISS SMS GMBH